Used AMAT / APPLIED MATERIALS Centura ACP DPN Plus Gate Stack #9383657 for sale
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ID: 9383657
Wafer Size: 12"
Vintage: 2010
Decoupled plasma nitride deposition system, 12"
DRAM Gate nitridation system
(4) Facet mainframes
(2) D746 DPN Plus
R741 RTP Radiance RP chamber
DPN Plus chamber options:
Generator
Enhanced pulsed RF RTP radiance chamber
Technology option
Open loop tuner
Process application
PNA
DPN Plus gas delivery options:
He 500 SCCM
N2 500 SCCM
RTP Gas panel options:
(10) Regulators and display
Factory interface options
Configurable colored light
Operator access switch
TIRIS With RF E99 Carrier ID
Light curtain
Docking flange shield
Single axis aligner
Remote Options:
Flat panel monitor, 17"
Non standard request
O-Ring type CHEMRAZ chamber C & D
RTP ACP Block II gas panel
NSR Celerity
2010 vintage.
AMAT / APPLIED MATERIALS Centura ACP DPN Plus Gate Stack is a high-performance, high-precision Etcher/Asher for sub-micron processing. It is equipped with Direct Plasma Naming (DPN) technology, allowing for precise selective etching and ashing of features from 0.3 µm 2/3 pitch down to 0.12 µm 1/2 pitch and double patterning at 0.09 µm 1/4 pitch for development. The Etcher/Asher is also compatible with a variety of substrates, such as silicon, semiconductors and metal oxides. AMAT Centura ACP DPN Plus Gate Stack offers an array of options for controlling the etching/ashing process. This includes the level of selectivity and resist presence on the wafer, setting the proper etching conditions, controlling the etching pressure, the etching duration, the etching rate and the endpoint quickly and accurately. It also allows the user to adjust the process efficiency, optimize the throughput and minimize edge effects. Additionally, the system can be used to etch several non-selective materials, such as silicon oxide, silicon oxide nitride and aluminum oxide. The system also offers a user-friendly, intuitive graphical user interface that makes it easy for operators to set up and monitor the process. The Etcher/Asher can be configured with a wide range of additional hardware and software options, such as a polishing head and a Plasma Viewer. The integrated real-time suite also provides a set of data, such as metrology data, as well process control information, to monitor the process on a wafer-by-wafer basis. In conclusion, APPLIED MATERIALS Centura ACP DPN Plus Gate Stack is an advanced etcher/asher, offering precision levels for even the most advanced process requirements. The optimal combination of control and process parameters, the wide variety of compatible materials, the intuitive graphical user interface, and the powerful data analysis tools, make Centura ACP DPN Plus Gate Stack a perfect solution for industries in need of sub-micron precision.
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