Used AMAT / APPLIED MATERIALS Centura AP AdvantEdge G5 Mesa Poly #9353988 for sale

ID: 9353988
Wafer Size: 12"
Vintage: 2014
Polysilicon etcher, 12" Silicon Axiom HT chamber: CCM Cover Chamber AC Cover (3) Silicon AdvantEdge G5 Mino chambers (3) Mesa sources AdvantEdge G5 Minos swap kit Gas panel: CL2 Purifier Factory interface: Right side storage pod Left side storage pod (3) Load ports Interface A (3) Info pads A or B (3) Operator access switches Front facing intake plenum Remote option: Voltage sag monitor Mainframe lifting sling: FIF kit 2014 vintage.
AMAT / APPLIED MATERIALS Centura AP AdvantEdge G5 Mesa Poly is an advanced etching and ashing equipment designed for high-end integrated circuits (ICs). It is a full-featured system that offers direct wafer connection to the reactor and full wafer access during etching, allowing for greater process flexibility and advanced process control. The unit boasts an integrated multi-wavelength optical-viewing machine and sophisticated high-precision motion control, making it ideal for deep-submicron device lithography. Additionally, AMAT Centura AP AdvantEdge G5 Mesa Poly equiped with a fast-acting, multi-zone heated platen for precise temperature control, as well as a range of beam-steering technologies for high-precision patterning. APPLIED MATERIALS Centura AP AdvantEdge G5 Mesa Poly is equipped with an advanced software interface, which allows users to program and store recipes and other critical parameters for each etching or ashing application. This interface also tracks tool performance with real-time graphs, to enable users to adjust parameters in order to keep a tight control over etching and ashing processes. Furthermore, a wide range of in-situ measurements can be made to provide deep insight into the etching or ashing processes and allow users to optimize their recipes accordingly. Centura AP AdvantEdge G5 Mesa Poly utilizes a precision-controlled etching process to guarantee uniform initial wafer profiles and best-in-class edge quality. This asset facilitates precise positioning of via holes and other fine features, even in the most advanced processes. Additionally, the model supports wafer diameters from 200mm to 315mm, and is fully compatible with a range of etch gases, providing ultimate flexibility depending on the application requirements. AMAT / APPLIED MATERIALS Centura AP AdvantEdge G5 Mesa Poly also achieves top-notch particle control, thanks to its tight process control and clean chamber design. This equipment is equipped with a comprehensive vacuum system, a rigorous mechanical and chemical-cleaning process, and carefully selected etching materials to achieve the highest level of particle-free addition to ensure better device performance and longevity. To sum up, AMAT Centura AP AdvantEdge G5 Mesa Poly is a top-of-the-line etching and ashing unit designed for high-end integrated circuits. This machine boasts an integrated multi-wavelength optical-viewing tool, precision-controlled etching, and advanced software interface for comprehensive process control. Moreover, the asset provides tight particle control and is fully compatible with a range of etch gases, making it the perfect choice for IC production.
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