Used AMAT / APPLIED MATERIALS Centura AP AdvantEdge G5 Mesa T2 Poly #293802312 for sale
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AMAT/AMAT / APPLIED MATERIALS Centura AP AdvantEdge G5 Mesa T2 Poly is an etcher and asher that is capable of performing both dry etch and wet etch processes. This etcher is equipped with a pneumatic cassette delivery equipment that can deliver consumables such as etch gases, plasma, materials, and slurry without manual intervention. The process chamber is hermetically sealed, enabling high concentrations of reactive gases to be used while minimizing contamination. The system features a 300 mm showerhead electrode to provide uniform plasma densities and high flexibility to achieve optimal etch process uniformity. The etcher is designed to deliver a cleaner substrate surface for further processing. The unit offers excellent process capabilities for hardened steels and advanced materials such as ceramic materials, tungsten, metals, and polymers. Its advanced process control machine enables precise control of etch parameters such as process time and pressure, as well as parameters associated with the plasma chemistry. This advanced etcher also features a high-temperature auto-calibration tool that enables it to automatically compensate for variations in material properties over time. This results in a repeatable and reliable process. In addition, APPLIED MATERIALS/AMAT Centura AP AdvantEdge G5 Mesa T2 Poly offers IC chip designers access to post-etch processing. It is equipped with an automated bevel edge passivation asset that is designed to produce a well-defined edge bead without creating surface roughness. The model is also compatible with a range of post-etch annealing processes including low-temperature annealing and rapid thermal annealing. AMAT / APPLIED MATERIALS/APPLIED MATERIALS Centura AP AdvantEdge G5 Mesa T2 Poly is designed to meet the high-quality requirements of today's demanding semiconductor manufacturing processes. This economical etcher meets or exceeds the requirements of most of today's leading IC chip designers and IC fabrication facilities, enabling repeatable and reliable etch and passivation processing. The equipment is cost-effective, enabling IC chip designers to use the same high-quality etch process for a wide range of advanced materials and sophisticated IC chip designs.
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