Used AMAT / APPLIED MATERIALS Centura AP AdvantEdge G5 Metal #293802318 for sale

AMAT / APPLIED MATERIALS Centura AP AdvantEdge G5 Metal is an etching system that is designed to fabricate devices requiring high aspect ratio etch linewidths and high X-Y etch uniformity. Featuring a robotized work cell, this etcher is capable of providing precise and repeatable process control, which is essential for high performance MEMS and semiconductor devices. AMAT Centura AP AdvantEdge G5 Metal includes a wet or dry etch tool that can be configured to meet various process requirements. The etch process is powered by an advanced ECR plasma source with hot wafer handling, providing low cost-of-ownership and high throughputs for mass production. In addition, the ECR plasma source is capable of delivering high selectivity and excellent etch quality while minimizing contamination. APPLIED MATERIALS Centura AP AdvantEdge G5 Metal support a broad range of materials such as copper, tungsten, and polysilicon, and allows for precise control of etch profile and feature size. It features a patented digital feedback subsystem for accurate and repeatable control of pressure, temperature, and flow rate, enabling it to meet tight tolerances and uniformity requirements. Centura AP AdvantEdge G5 Metal also features advanced centrifuge switching and a wafer prealigner, which are important features for advanced microelectronic device manufacturing. The centrifuge enables users to switch etch recipes on the fly without having to re-align each wafer before processing. The wafer prealigner ensures accurate wafer positioning prior to etching and offers the flexibility to accurately process multi wafer configurations from one run. AMAT / APPLIED MATERIALS Centura AP AdvantEdge G5 Metal is a one-stop, integrated etch system that is capable of high aspect ratio etches with feature sizes ranging from 0.2 mu to 5 mu. It utilizes best-in-class materials such as ceramic chamber architecture, advanced metal seed and trimming masks, and ceramic heating elements to ensure optimal process control, maximum repeatability, and superior yield. Additionally, the etcher includes comprehensive recipe and software capabilities for data acquisition, diagnostics, and process optimization.