Used AMAT / APPLIED MATERIALS Centura AP DPS MINOS #293625373 for sale

ID: 293625373
Wafer Size: 12"
Vintage: 2011
System, 12" 2011 vintage.
AMAT / APPLIED MATERIALS Centura AP DPS MINOS Dry Strip Asher is a equipment for dry etching of substrates and thin films. This advanced etching system offers the highest uniformity of any dry etching unit available on the market today. Its unique design allows for etching of large surfaces quickly and efficiently with excellent uniformity and repeatability, providing a cost-effective solution for numerous thin-film deposition, etching and passivating applications. AMAT Centura AP DPS MINOS utilizes an industrial-grade plasma source and advanced process control technologies to achieve a highly uniform and repeatable process. The etching process is controlled by a programmable controller which is connected to a PLC. This ensures that the process parameters and timing are always consistent, resulting in uniform thickness etching, and minimal over etching or under etching of items. The high etching uniformity is further enhanced by an advanced wafer patterning algorithm which is integrated into the machine to ensure that the etching process is perfectly optimized for the type of substrate being etched. The tool also features a full range of safety features. These include protected power sources, magnetically shielded process chambers, and a range of alarms and monitors to ensure that the process is running safely and in accordance with manufacturer's guidelines. APPLIED MATERIALS Centura AP DPS MINOS offers the highest etch uniformity of any dry etching asset currently available. Its advanced process control technologies, including in-line process monitoring, ensure repeatability, reliability and quality. Its sophisticated wafer patterning algorithm ensures that the process is optimized for the specific substrate being etched. Additionally, the model's safety features ensure that the process is running safely. This advanced etching equipment is able to provide cost-effective solutions for numerous thin-film deposition, etching and passivation applications.
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