Used AMAT / APPLIED MATERIALS Centura DPS II Mesa #293608133 for sale

ID: 293608133
Wafer Size: 12"
Etcher, 12" EFEM: KAWASAKI ATM Robot (4) Process chambers: (3) DPS II Chambers Axiom chamber Buffer chamber (VHP + Robot) Process: Poly AC Rack.
AMAT / APPLIED MATERIALS Centura DPS II Mesa is a powerful etcher/asher that is used in semiconductor applications. It has an ultrahigh directional etch and ashing capability for high throughput and process control. AMAT Centura DPS II Mesa utilizes a high-definition plasma source, advanced process controls, and a unique integrated hardware platform to deliver superior ashing and etching performance in the most challenging applications. APPLIED MATERIALS Centura DPS II Mesa is a tool that allows for precision processing of semiconductors. It has three different source types - positive (positive-bias), negative (negative-bias), and neutral (non-biased) - for different etch and ashing scenarios. It can accommodate wafers up to 8 inches in diameter and can process multiple wafers simultaneously. Centura DPS II Mesa features advanced etch/ash process control capabilities, allowing users to achieve precise results in a variety of applications, such as shallow trench isolation (STI), photoresist ashing, and metal etching. The tool also supports advanced operating parameters, including gas mixture, RF power, and chamber pressure, which can be programmed and monitored in real-time. AMAT / APPLIED MATERIALS Centura DPS II Mesa is designed to be highly reliable, efficient, and easy to use. It features a self-monitoring system that reduces maintenance burden, and a built-in eyelet that facilitates process-critical wafer tracking for accurate and efficient processing. It also has a user-friendly interface that allows for easy parameter setup and management. AMAT Centura DPS II Mesa is an etcher/asher that provides superior performance and reliability for semiconductor applications. It has advanced process control technology and a unique hardware configuration to deliver precise etch/ash results. It is easy to use and has a low maintenance burden. It is an ideal solution for users who require high-precision, high-throughput processing for their semiconductor applications.
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