Used AMAT / APPLIED MATERIALS Centura DPS II Metal #293624189 for sale
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ID: 293624189
Wafer Size: 12"
Vintage: 2005
Metal etcher, 12"
EFEM
Process: Metal
TM Module
(3) G2 Metals
AC Rack
Side storage
(2) SMC Chillers
(3) Cathode chillers
Utility box
Tote
2005 vintage.
AMAT / APPLIED MATERIALS Centura DPS II Metal is a wet etch and asher equipment used to fabricate integrated circuits in semiconductor device manufacturing. Compared to the traditional wet etching process, AMAT Centura DPS II Metal provides significantly improved performance, efficiency and yield. The system is composed of two main components. The first component is the chamber which contains a polymer source, a Sujin jet, and a vacuum source. The chamber is designed to achieve very uniform processing, eliminating surface defects and enabling tight process control. The magnets in the polymer source can be configured for low-energy and high-energy operations resulting in more precise process control. Additionally, the Sujin jet creates a uniform etch pattern allowing for a more controlled etching profile than traditional wet etch processes. The second component of the unit is the controller. It consists of a programmable logic controller (PLC) with a vacuum machine, chamber pressure sensor, and a dry cabinet. The PLC provides the chamber and vacuum tool with set points and control commands during etch and asher operations for enhanced process control. The pressure sensor inside the chamber aids in providing accurate process control through monitoring of atmospheric pressure to ensure uniform etch results. The dry cabinet contains oxygen-sensitive components and also helps with temperature control, ensuring that the asset remains in a stable temperature range. Further, the model has an automated loading equipment to ensure repeatable results by loading the wafers in the same position every time. Overall, APPLIED MATERIALS Centura DPS II Metal possesses multiple features that make it a great choice for semiconductor device manufacturing in terms of optimal performance, efficiency, and yield. It produces high-quality results quickly and with minimal defects due to its precise process control capabilities. The automated loading system also helps to minimize any inconsistencies between wafers. Its user-friendly interface makes it easy to adjust the process settings for different etch and asher needs. All of these advantages make Centura DPS II Metal a reliable choice for cleaning and etching needs in the semiconductor industry.
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