Used AMAT / APPLIED MATERIALS Centura DPS II Metal #9274959 for sale
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ID: 9274959
Wafer Size: 12"
Vintage: 2005
Metal etcher, 12"
EFEM (YASKAWA)
(3) G2 Metals
Axiom (VODM)
AC Rack
Side storage
(3) SMC Chillers
(2) Cathode chillers
Utility box
Tote
2005 vintage.
AMAT / APPLIED MATERIALS Centura DPS II Metal is a dry plasma etcher and asher equipment that is specifically designed to process semiconductor based materials to create various device structures. The system is capable of producing precise etching and ashing results with the highest of precision and accuracy. AMAT Centura DPS II Metal can complete the etch and ashing processes for both metal and dielectric layers as well as for a variety of different device structures such as contact holes, gate stacks, and patterned diffusion regions. It uses an advanced etching process called plasma-enhanced chemical vapor deposition (PECVD) to etch and process the material, which is then followed by a deposition process. This advanced etching process is capable of providing selectivity and high etch rates for a broad range of application requirements. APPLIED MATERIALS Centura DPS II Metal achieves its precise and accurate performance through a variety of sophisticated design features. These features include its advanced plasma processing chamber which is designed to provide uniform etching over a broad range of substrate sizes and structures. The 10kW RF matching network is a unique feature of the unit as it allows operators to tune the etching process to a variety of different substrates and process conditions. Other advanced features of the machine include its advanced optical reduction capability, which helps to provide advanced surveillance over the entire etching process, as well as its patented reactive ion etch (RIE) technology which enables uniform etching over a large area. The Centura DPS II also includes a range of substrate treatment tools to further enhance its capabilities. These tools include a self-cleaning substrate chamber, which efficiently removes contaminants during the etch and ashing process, and a built-in ion bombardment capability which can be used to accelerate the etch rate of the process. An optional temperature control unit is also available enabling the operator to process a wide variety of materials over a large processing temperature range. Centura DPS II Metal is a highly reliable etching and ashing tool with superior performance capabilities. The asset is also extremely user-friendly with its intuitive graphical user interface which provides operators with a clear understanding of the etching process. With its advanced processing features, AMAT / APPLIED MATERIALS Centura DPS II Metal can provide the highest level of precision and accuracy in the etching and ashing of a wide range of materials, making it an ideal model for processing and developing high-performance semiconductor-based devices.
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