Used AMAT / APPLIED MATERIALS Centura DPS II Poly #9275303 for sale

AMAT / APPLIED MATERIALS Centura DPS II Poly
ID: 9275303
Wafer Size: 12"
Vintage: 2006
Poly etcher, 12" EFEM TM (3) DPS2 Axiom AC Rack 2006 vintage.
AMAT / APPLIED MATERIALS Centura DPS II Poly is an advanced etcher / asher, designed for rework applications. It is based on the Centura etcher platform and features a unique, two-step process that allows for rapid etching and effective removal of a variety of materials. The equipment is designed with a double spin feature, allowing for reliable and repeatable processing with uniformity and control. This allows for all aspects of etching, such as selectivity control, process time, beam power, gas mix, and process gas adjustments to be precisely tailored to maximize process throughput with maximum etching precision and quality. AMAT Centura DPS II Poly features a dual-source reactive ion etch (RIE) source containing two separate sources, which feature independent control over the respective reactor pressure, plasma power, and RF frequency control. This ensures precise etch depth control and uniform etching. The system also includes built-in process monitoring, enabling users to customize the etching process, monitor quality assurance, and analyze results to ensure optimal results. APPLIED MATERIALS Centura DPS II Poly also features an advanced design which includes a separate plasma source and anode chamber, complementary dual-frequency power supply, precision-controlled wafer stage and clamping unit, and a dynamic gas source delivery machine. This tool can provide uniform etch profiles and the ability to etch a wide range of materials, including metals, ceramics, polymers, and composites. The asset also features built-in automated sample handling, as well as highly customizable process and monitoring tools, providing users with flexibility, repeatable processes, and enhanced productivity. This advanced etcher / asher is designed to produce a high dt/dz ratio, providing high degree selectivity for etching of high aspect ratio structures. Centura DPS II Poly etcher / asher is designed for industrial production line applications and is rugged and reliable. It is a perfect choice for rework applications and offers high throughput with superb etch profile control, fast clean-up times, and excellent uniformity. This etcher / asher provides an excellent solution for rapid and precise etching of a wide variety of materials.
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