Used AMAT / APPLIED MATERIALS Centura DPS II Poly #9293614 for sale

AMAT / APPLIED MATERIALS Centura DPS II Poly is an etcher/asher used in the fabrication of semiconductor components used for microtransistors and other integrated circuits. This type of equipment uses a process of adding or removing material to form a desired result. It is a type of dry etch equipment, meaning that a vacuum or plasma is used to remove material instead of liquid etchants. The etchant may be an organometallic compound or a gas. It's used primarily for processing of silicon, especially phosphosilicates, and other dielectric materials. AMAT Centura DPS II Poly has a compact, flexible design with several features that make it well suited for high-precision processing. It is equipped with a large, 4-axis chuck and a powerful etch chamber that is capable of high throughput rates due to its advanced process control system. This technology is designed to increase process repeatability and reduce waste. The combination of extensive monitoring and control of the etch process ensures the highest quality results. APPLIED MATERIALS Centura DPS II Poly also features a wafer-into-chamber loading mechanism, pulse-width modulation for precise and consistent delivery of etchant, and a tight sub-micron etch accuracy. Additionally, Centura DPS II Poly has a multi-zone capacitive compensation unit designed to equalize the substrate surface and ensure uniform etching. It also has an automated scanning optics machine for optimal imaging and metrology performance. AMAT / APPLIED MATERIALS Centura DPS II Poly also provides an enclosed environment, which helps maintain a controlled etch chemistry and reduces the risk of contamination and outgassing. It also has an automated safety interlock tool, which provides safety measures for personnel and tools. This asset is also capable of automated recipe creation and storage, which reduces time spent on setup between etch steps. AMAT Centura DPS II Poly is the ideal tool for a wide range of etch applications, from shallow trench isolation structures to advanced metallization layers. Thanks to its advanced etch technology and process controls, it is well suited for applications that require high precision and repeatability. This high performance etcher/asher is suitable for use in advanced nanoelectronic processing, making it a key part of the process of fabricating contemporary electronic components.