Used AMAT / APPLIED MATERIALS Centura DPS2 G5 #9286831 for sale

AMAT / APPLIED MATERIALS Centura DPS2 G5 is an advanced etch/ash equipment used in advanced semiconductor fabrication. It is designed to etch or ash dielectric and conductive structures in silicon wafers of up to 300mm in size. The system features a powerful wafer support unit which utilizes an electrostatic clamping mechanism to ensure that wafers remain securely and precisely positioned throughout the entire process. This prevents any particles or contaminants from being introduced to the etched or ashed surfaces. AMAT Centura DPS2 G5 also features a powerful set of process chambers, including the Main Chamber, Isolation Chamber, Stage Channels, and Propulsion Chamber. The Main Chamber is where etching or ash take place and features a powerful electron cyclotron resonance (ECR) plasma source that is efficient, reliable, and has a long life. The Isolation Chamber allows for selective processes and is equipped with a gas injection machine that ensures uniform deposition of material across the dielectric layers. The Stage Channels provide a safe and direct connection from the load capacity station to the Main and Isolation Chamber. The tool also features a number of advanced process control capabilities including process time monitoring, temperature control of up to 1000°C, multiple recipe capability, and plasma control including power and gas flow. Additionally, APPLIED MATERIALS Centura DPS2 G5 is capable of etching or ashing with a variety of process chemistries, including fluorine chemistry and metal chemistry, allowing for increased process flexibility. Centura DPS2 G5 is a powerful and precise etch/ash asset, ideal for any advanced semiconductor fabrication facility. Its advanced process control capabilities, powerful wafer support model, and superior etch/ash capability provide a reliable and effective tool for device fabrication.