Used AMAT / APPLIED MATERIALS Centura MxP+ Super-E #9293833 for sale

AMAT / APPLIED MATERIALS Centura MxP+ Super-E
ID: 9293833
Dry etcher Parallel plate type: RIE.
AMAT / APPLIED MATERIALS Centura MxP+ Super-E Etcher / Asher is an advanced, precision wet etching equipment designed for high throughput production of opto-electronics and semiconductor devices. The system utilises a sequence of process conditions to provide high etching rates with excellent surface smoothness and selectivity. Features of AMAT Centura MxP+ Super-E include a Variable Speed Substrate Rotator, high temperature process chambers, and a multi-zone temperature control platform. Automated thermal management optimises etch uniformity, and multiple independent process tanks enable multi-step etching. The unit offers precise temperature control, precise process control, repeatable process parameters, and stringent environmental compliance. APPLIED MATERIALS Centura MxP+ Super-E features an advanced wafer chuck design that is compatible with a wide range of substrates, including Si and III-V materials. The chuck can be heated up to 950 °C for oxide etching, and the accurate heating parameters are tightly controlled for etch uniformity, higher throughput, lower reject rates and improved yields. The powerful Enerjector™ RF generator offers precise degree of controllability and enables precise process control when tuning etching parameters. Centura MxP+ Super-E provides cost-effective wet etching and meets challenging yield, uniformity, and selectivity requirements. It can also be configured for multi-module configurations to increase throughput and handle multiple wafer sizes. The machine also provides a wide range of chemistries and reproducible etch profiles. It features automated wafer to wafer uniformity and a process monitor that can be used to monitor the etch process in real-time. This ensures consistent results and helps in meeting the highest quality standards.
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