Used AMAT / APPLIED MATERIALS Chamber for Centris SYM3 Poly #293659650 for sale

AMAT / APPLIED MATERIALS Chamber for Centris SYM3 Poly is an etcher/asher that was specifically designed to process etch-back/strip, gap-fill, and planarize high-aspect-ratio vias and contacts in a variety of substrates, including Si, SiGe, SiC, and GaAs. It is equipped with two independent chambers for complete process control, allowing for both etch-back and strip on the same wafer. The chamber can support 10-inch or 12-inch wafers, making it compatible with the most common wafer sizes used in the integrated circuit (IC) fabrication process. AMAT Chamber for Centris SYM3 Poly is equipped with an automated process-control system that is designed to optimize process yields and cycle times. It provides high process uniformity and reproducibility, while also enabling real-time quality control and feedback. The chamber's user interface is designed for ease-of-use and process optimization. It offers quick recipe setup, real-time recipe adjustment, and recipe monitoring capability. Additionally, the chamber is capable of running uniformity checks before and during the process to ensure high yields and throughput. APPLIED MATERIALS Chamber for Centris SYM3 Poly is equipped with several features to improve process quality including a hot gas heater design for improved contacts and gap fills, as well as a laser interferometry system for height measurements. The chamber also offers several gas-flow-management and pressure-control options to enable advanced etch-back and gap-fill recipes. Chamber for Centris SYM3 Poly is designed to provide high-precision processes to support the development of next-generation ICs. This state-of-the-art chamber offers optimal process performance, user flexibility, and improved yields. Combined with precise processing parameters and clean processing environment, this etcher/asher is capable of producing top-notch results for most IC fabrication requirements.