Used AMAT / APPLIED MATERIALS Chamber for Centura #9411364 for sale
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AMAT APPLIED MATERIALS Centura Chamber is a two-stage etch/ash equipment designed to provide maximum performance for etch and ash processing in semiconductor and MEMS applications. This system is designed to handle the most demanding etch and ash requirements with excellent etch-to-ash ratios, long-term reliability and high throughput. The chamber is engineered for precision etch and ash control, throughput optimization and wafer end-effect control. The first part of the unit is the etch chamber, where plasma is produced to achieve a high rate, reproducible etch process. To achieve the highest selectivity and yield, accurate monitoring and control of the etching process are enabled through the integrated process controller. The etch process is powered by an independent source that provides optimal etching performance across all process conditions. The second part of the machine is the ash chamber, which allows for a high-precision ash process, with minimal back-side damage and minimal ash depletion. The ash controller provides consistent performance in both manual and automated environments. For maximum flexibility, the Centura tool can be configured with a single or double chamber configuration. The dual-chamber asset includes the pure-etch process chamber and the ash process chamber. This model allows for back-to-back etch and ash processing, enabling increased wafer throughput. This equipment features advanced features such as auto-tune, temperature controlled plenums, multi-channel showerhead with purified carrier gas and automatic substrate temperature control. These features enable tight process control and help ensure repeatable and reproducible processes. The Centura Chamber is designed for SEMI-S2 compliant processes and has tight control over chamber pressure, temperature, electron flux and other process factors. The system also features advanced safety features and is designed to be operationally and environmentally responsible. A wide range of components enables flexibility and compatibility with a variety of configurable upgrades. These include load lock and transfer modules, robotics, RF generators, turbomolecular vacuum pumps and process gas purification. The Centura Chamber is an advanced etch/ash unit that provides high-precision, repeatable and reproducible etch and ash processes in a single chamber or dual-chamber configuration. Built for maximum process flexibility, this machine enables tight control over etching and ash parameters, ensuring pressure, temperature and drift-free process control.
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