Used AMAT / APPLIED MATERIALS DPS AE Poly G3 #9137290 for sale

AMAT / APPLIED MATERIALS DPS AE Poly G3 is a plasma etcher/asher that is designed to etch and passivate substrates of various materials. The equipment is capable of processing both 'hard' and 'soft' materials, providing excellent results in each type. The system is composed of an electromagnet-based plasma reactor, where plasma is generated by applying high frequency power to the process. The plasma can be tuned to varying densities, allowing for optimum removal of both organic and inorganic layers. It also uses advanced etching techniques to minimize the impacts on the substrate. AMAT DPS AE Poly G3's design increases throughput while maintaining high-quality results. It works in tandem with a Faraday rotating shield which enables simultaneous etching and plasma generation. The shield further helps to control the etch angle and etch rate, allowing for fast, uniform processing of the substrates. The unit is easy to use and requires minimal maintenance, making it suitable for both research and production. The machine has a range of optional accessories which can increase its functionality, such as a substrate uniformity scanner, a reactive-ion etch tool, and a plasma conditioner. APPLIED MATERIALS DPS AE Poly G3 is a robust and reliable tool for etching and passivating substrates. It has built-in power and process monitoring capabilities which can be used to ensure consistent etching results. This tool is a great choice for the etching of a wide variety of materials, offering fast, high-quality results.