Used AMAT / APPLIED MATERIALS DPS G5 #293764820 for sale

AMAT / APPLIED MATERIALS DPS G5 is a highly reliable asher/etcher designed for high-throughput processing across a broad range of devices in the semi-conductor industry. This equipment is designed for large scale wafer-level cleaning, etch, ash and deposition processes, with the capability to integrate various functions and technologies into a single platform at high speed. AMAT DPS G5 provides higher reliability and improved performance over preceding systems. This system is able to provide an impressive throughput of up to 60 wafer fabrication operations per hour. The advancements made by this unit enable greater efficiency in the fabrication of a high variety of wafer devices such as IMD, MEMS, and Touch Panel. APPLIED MATERIALS DPS G5 utilizes both advanced chemistries and state-of-the-art technologies to achieve maximum etch and ash performance. The machine is equipped with a high-end 5,000W RF generator that is optimized for the desired chemistries, thus assuring a success rate of up to 99.9%. The tool is also capable of adjusting the RF power automatically to fit the reaction time of the chemical process used in the substrates being treated. Furthermore, DPS G5 utilizes an advanced PFA (Pressure Flow Analysis) subsystem that is capable of automatically maintaining the desired temperature, pressure, and flow during the etch and ash process. This asset is designed with a multi-vacuum/gas manifold that is able to optimize the process by controlling the flow rates accurately, thus assuring a successful fabrication process of the wafer device. AMAT / APPLIED MATERIALS DPS G5 is also equipped with a unique Process Control Model that is able to monitor, store, and analyze chemical and substrate characteristics. This ensures that the highest level of process control is maintained throughout all stages of the fabrication process, while also permitting users to access detailed process reports for improved analysis, refinement, and fabrication. AMAT DPS G5 is the ideal choice for reliable and efficient wafer-level etch and ash processes in the semi-conductor industry. It provides higher throughput, enhanced process control, state-of-the-art technologies, and sophisticated chemistries to assure maximum reliability and efficiency during fabrication.