Used AMAT / APPLIED MATERIALS DPS G5 #9375195 for sale
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ID: 9375195
Poly etcher, 12"
AC Remote power rack
CHX Chiller
EDWARDS IXM 1800 Dry pump
Chambers:
(3) DPS (A, B, C)
AXION (D)
FI (EFEM):
UPS
MKS Macronode
Keyboard Video Mouse (KVM)
Ethernet switch hub
Fast Data Gateway (FDG)
Short flex controller assy
Light curtain
Load port
RFID
Aligner
Robot controller
Ionizer controller
Light tower
Intake plenum enclosure
MF:
Type: AP
TM Robot
TM Robot controller
TM Robot blade
Integrated point of use pump (I-PUP)
TM Baratron gauge
TM Vacuum gauge
Load lock vacuum gauge
Load lock indexer controller
TM Diffuser
Load lock vent valve
Load lock heater controller
Load lock door
Auto Pressure Controller (APC)
Slit valve
GME Chamber port Assy
Lid
Bulk gas delivery
Modular DNET IO Controllers (MDI)
Process chamber:
Chamber Control Module (CCM)
Source coil
Source ceramic lid
Source lid heater
Upper liner
Lower liner
Cathode liner
Flow equalizer
Slit liner door
Cathode assy
ESC RF Filter box
AC Distribution box
Temperature controller
Throttling gate valve
Eyed OES Spectrograph
Electrostatic Chuck (ESC)
HE Controller
Ion gauge
Pumpstack
Chamber lift assy
TGN Gas delivery
Vacuum gauge
Vacuum switch
Pump
Foreline ISO Valve
RF Match box and generator
Strip chamber:
Chamber Control Module (CCM)
Pedestal assy
Throttling gate valve
Foreline ISO Valve
AC Distribution box
Temperature controller
Vacuum gauge
Vacuum switch
Remote plasma source
Gas panel:
Type: NEXTGEN (16) Sticks
Gas weldment type: Single line drop
Mass Flow Controller (MFC)
Flow Ratio Controller (FRC).
AMAT / APPLIED MATERIALS DPS G5 is a Deep Reactive Ion Etch (DRIE) and Asher equipment with an extensive list of features and capabilities. It works by using ions to etch or asher a material, usually a semiconductor, to create desired patterns. It is comprised of several components, such as a source chamber and pressure chamber, to support its specialty functions. The source chamber includes a vapor injection system, as well as a modular, removable manifold design. This chamber is held under vacuum conditions for reliable material etching. Tests have proven its reliability and repeatability. The pressure chamber houses the process gases. This is where the bulk of the etching occurs, and is kept precisely at a requested pressure. The chamber also comes equipped with a safety pressure interlock unit, remote pressure monitoring, and pressure regulation. AMAT DPS G5 is designed to be user-friendly and was built for repeatability of results. It is equipped with two 50 MHz RF generators to ionize the process gas to etch the material. The machine also features a high voltage DC bias technol- ogy, as well as a plasma oxidation tool to ensure that the etch rates are consistent. The range of materials that the asset can etch is quite extensive, including Silicon, Silicon Nitride, and other semiconductors. The model is capable of producing a controlled etch profile, even on softer materials like Gold. The plasma etching and ashing processes are both quite fast and can be completed in a relatively short amount of time. The built-in temperature control and safety feature, as well as the adjustable parameters and process time, make the equipment easily adjustable to a variety of projects and applications. Overall, APPLIED MATERIALS DPS G5 is an excellent etcher and asher to tackle many different projects. With its reliable components, easy user-interface, and adjustable features, it ensures that projects are performed with accuracy and precision. The system has proven its worth in many industries, and its vast range of materials and capabilities make it an unbeatable option.
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