Used AMAT / APPLIED MATERIALS DPS II AE G3 #9206067 for sale

AMAT / APPLIED MATERIALS DPS II AE G3 is a high-efficiency etcher and asher equipment designed to meet the needs of current production lines in the semiconductor industry. This system uses advanced etching and ashing techniques to rapidly and accurately etch and asher films in a variety of materials. AMAT DPS II AE G3 unit has a high repeatability of etching and ashing due to its advanced etching and ashing process. It has a high accuracy control machine which can accurately control the deposition and etching times and parameters for high-end material processing. APPLIED MATERIALS DPS II AE G3 uses an electron beam to deposit, etch and asher thin films from the substrate. The electron beam is directed over the surface of the substrate to deposit, etch and asher films. This is done with precision and accuracy, as the substrate is scanned continuously in X, Y, and Z directions. DPS II AE G3 is very flexible and customizable, offering a wide variety of other etching and ashing methods. This tool also has a feature that allows the user to select optimal etching and ashing parameters for each layer, depending on the materials being processed. This asset also offers the ability to save and recall etching and ashing parameter settings for reduced wafer cycle times. In addition, AMAT / APPLIED MATERIALS DPS II AE G3 also offers a high-speed end-point detection model which allows for the accurate monitoring of the whole process, from start to finish. This equipment monitors pressure, temperature, and composition, as well as other parameters that can affect the deposition and etching process. It can also detect any defects that may occur in the process, and can alert the user accordingly. AMAT DPS II AE G3 is a reliable and efficient etcher and asher system for processing a variety of materials. With its advanced etching and ashing process, this unit offers high precision, accuracy, repeatability, and a wide variety of other processing methods. This machine is an ideal solution for semiconductor production lines to rapidly and accurately etch and asher films to meet specific requirements.