Used AMAT / APPLIED MATERIALS DPS II AE G3 #9301026 for sale

ID: 9301026
Wafer Size: 12"
Vintage: 2006
Etcher, 12" Process: Poly G3 (3) Chambers 2006 vintage.
AMAT / APPLIED MATERIALS DPS II AE G3 Asher and Etcher is an advanced semiconductor processing equipment used to form critical components in the electronics industry. The equipment uses plasma etching and ashing to create ultra-fine patterns and structures on a range of substrates, including glass, silicone, and metals. The G3 model has a process chamber of up to 600mm, and is able to accommodate up to eight platens. The system is engineered with an Integrated Tool (IT) platform, which combines the unit's various components into a single device, and allows the operator to control the whole machine through the use of a single interface. AMAT DPS II AE G3 Asher and Etcher utilizes multiple patented technologies to achieve effective and uniform plasma processing. The equipment's Plasma Immersion Ion Technology (PIIT) allows for lower cost and faster etching rates, while the Internal Source of Self-Organization (ISSO) helps to achieve larger fields-of-view and precise patterns. The G3 model includes an innovative power supply module with an advanced digital control tool, which provides precise control of the entire process. APPLIED MATERIALS DPS II AE G3 Asher and Etcher is a reliable and efficient asset, designed to withstand various conditions. Its innovative Shutterless Etcher allows for rapid cooling of etch gases, eliminating cycleside damage and increasing tool stability. The model is equipped with an online energy-monitoring equipment, to help track and monitor the process at any time. This advanced system provides the flexibility to create a variety of fine patterns and structures, using a range of chemistries and gases. DPS II AE G3 supports reactive gases, such as O2, CF4, CHF3, and H2, as well as etchant gases, such as N2, Ar, He, and Xe. AMAT / APPLIED MATERIALS DPS II AE G3 also features a wide range of process parameters, including temperature, pressure, and voltage, which can be tailored to accommodate the needs of any application. AMAT DPS II AE G3 Asher and Etcher is a powerful, reliable, and versatile unit, designed to meet the needs of today's electronics industry. With its advanced control machine, the G3 model allows for precise process control, ensuring consistent results across each substrate. The innovative Shutterless Etcher feature, combined with its wide range of process parameters, allows for rapid, uniform etching and ashing, without risking damage to the substrate material. APPLIED MATERIALS DPS II AE G3 is the perfect tool for those looking to create complex patterns and structures in even the harshest of environments.
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