Used AMAT / APPLIED MATERIALS DPS II AE #9379752 for sale

AMAT / APPLIED MATERIALS DPS II AE is a high-performance, direct current plasma etcher / asher designed for the precise removal and cleaning of layered materials in the wafer-scale fabrication of semiconductor based products. AMAT DPS II AE takes advantage of its innovative direct current plasma technology to deliver ultra-fast etching of layers down to the nanometer scale with excellent uniformity. APPLIED MATERIALS DPS II AE boasts a full-featured user interface and a range of powerful software features for controlling the etching process, including recipe tracking, automatic parameter tuning, real-time process monitoring, and control of gas flows and electrode currents. DPS II AE is capable of etching at temperatures up to 200°C and with etch rates ranging from 200 µm/min to 10 nm/min. In addition to its advanced etch capability, AMAT / APPLIED MATERIALS DPS II AE is also equipped with an integrated after-etch (ASH) chamber for cleaning the etched layer, enabling rapid removal of organic residues without introducing particle contamination. The ASH chamber is designed to reliably scrape any residue off of the wafer surface before it can cause significant damage. In order to ensure a consistently accurate etching, AMAT DPS II AE is equipped with several sensor and control systems. These include a built-in gas flow controller, controlled differential pressure chamber, pressure gauge, temperature sensor, and RF plasma generator. This combination of sensors and controllers allows for precise control of the etching process and provides consistently consistent results with minimal variation. In terms of safety, APPLIED MATERIALS DPS II AE is CE certified, and meets or exceeds all applicable requirements for etch / asher safety. Its interior is effectively sealed from the exterior environment, while redundant power sources and power management features are in place in order to provide reliable and safe operation. All in all, DPS II AE is an incredibly powerful and versatile etcher / asher ideal for use in the fabrication of semiconductors. Its direct current plasma technology offers fast, repeatable and accurate etching along with a high degree of control over the etch process. It is also CE certified for maximum safety, and is equipped with all the features necessary for safe and efficient wafer-scale fabrication.