Used AMAT / APPLIED MATERIALS DPS II AE #9383380 for sale

AMAT / APPLIED MATERIALS DPS II AE (Etch/Asher) is a widely used process tool in the semiconductor industry. It is suitable for applications like etching, ashing, descum, and reaction plasma cleaning processes. It is well suited for etching and ashing of oxidized layers from wafers, as well as descum, CMP pad cleaning, and cleaning of contact holes. It is capable of processing a wide range of wafer sizes from ultra-thin wafers to 6 inch diameter wafers. The main components of AMAT DPS II AE (Etch/Asher) include the hardware - the power supply, the plasma source, the heat exchanger, the gas cabinet, and tube present in the process chamber. The power supply is configurable for either AC or DC operation. The plasma source is a RF generator, capable of running up to 40MHz, and it has been enhanced with a pulsed power output function. This pulsed output allows the RF source to operate successfully in high plasma density processes. Moreover, it helps minimize blower noise in a production environment. The heat exchanger is made of a copper/nickel alloy and is designed to maximize thermal efficiency within the process chamber. The gas cabinet is fitted with valves and filters to provide a reliable inlet of gases to the process chamber. Lastly, the tube present inside the chamber uses an RF matched input, which assists in delivering a homogenous gas flow to the wafer and also helps in controlling the plasma. The DPSTM-II AE has several features that make it reliable and precise for etching and ashing processes. It is equipped with an automated process monitoring and control equipment that allows the operator to set up and optimize the operating parameters based on the process characteristics. It also has a chamber cooling system that helps to maximize the process stability and ensure even thermal patterns in the chamber. In addition, its multi-point temperature measurement unit helps to accurately measure and adjust the temperature of the process chamber. APPLIED MATERIALS DPS II AE (Etch/Asher) machine also provides a safe platform for etching and ashing processes. Its process chamber is designed for VOC exhaust rates that meet the environmental regulations of most countries. Furthermore, it is equipped with an advanced safety tool that is designed to detect any malfunction in the asset and shut it down in case of an emergency. All in all, DPS II AE (Etch/Asher) is an efficient and reliable process tool that is an essential tool for the fabrication of semiconductor components due to its ability to provide uniform etching and ashing processes in a controlled environment. Its advanced features and safety systems make it an ideal tool for any semiconductor fabrication process.