Used AMAT / APPLIED MATERIALS DPS II #9067210 for sale
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ID: 9067210
Wafer Size: 12"
Chamber assemblies, 12"
(2) HP+ TxZ chambers
(1) IMP chamber
(1) Pre-clean chamber
Narrow body loadlock (can be converted to WBLL) available.
AMAT / APPLIED MATERIALS DPS II is an advanced Digital Plasma Source (DPS) etcher/asher equipment designed for advanced and sophisticated etching, ashing and oxidative processes. This system incorporates a gas/plasma box (GPB) chamber with an independently variable powered electrode, a low thermal mass RF platform with plasma source up to 600 watts, and an integrated control unit with multiple precision process control options. The versatile process capabilities of AMAT DPS II enables complex etching, ashing and oxidation of different materials including hard non-volatile-type materials. The unique design of the machine allows for the independent adjustment of process parameters in order to achieve the most precise results. This include the ability to control the pressure, gas flow, gas composition, gas purity, RF power, RF frequency, plate voltage and plate current simultaneously to provide the highest etching/ashing across all process conditions. Moreover, the tool also allows for precision adjustment of the location of the pulsed ions in the chamber to ensure uniform removal of material across the surface. APPLIED MATERIALS DPS II asset offers users a range of automation and monitoring capabilities to achieve the best results in a safe and efficient manner. An optional Auto-Tune Controller allows for the automatic optimization of the RF power and RF frequency based on the best etching/ashing results. The integrated computer management station interface allows operators to monitor and manipulate the model components in real time through applications such as process monitoring, parameter set-up and recipe testing. DPS II also offers the capability to execute complex multi-step processes in a single run, enabling high-precision etching and ashing processes. AMAT / APPLIED MATERIALS DPS II is designed to meet the demands of a wide range of users from device research to semiconductor fabrication and amenable to future changes in process conditions. Highly reliable and repeatable etching, ashing and oxidation processes are achieved by AMAT DPS II, making it an ideal choice for thin-film deposition or etching and ashing applications where reliability and accuracy are paramount.
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