Used AMAT / APPLIED MATERIALS DPS II #9204534 for sale

AMAT / APPLIED MATERIALS DPS II
ID: 9204534
Wafer Size: 8"
Chamber, 8".
AMAT / APPLIED MATERIALS DPS II Etcher/Asher is a reliable, high performance plasma etching equipment designed for precise etching of both thick and thin film materials. It provides high throughput and enables both dedicated etching and ashing of various materials. AMAT DPS II Etcher/Asher has a multi-chamber architecture that provides fast cycle times and enables the processing of multiple wafers in less time. The wafer carrier is designed to quickly switch between separate chambers, allowing for efficient throughput. All independent chambers are powered by independent RF generators, allowing for optimal process conditions each cycle. The etching process can be finely tuned to provide the best results and maximum yield with every cycle. The system provides precise position controls and allows for variable pressure control capabilities. A plasma optimization unit is included to maintain plasma quality and provide the highest etch rates. Additionally, a full suite of automated process recipes, diagnostics, and process management capabilities make APPLIED MATERIALS DPS II Etcher/Asher easy to use. DPS II Etcher/Asher is an extremely reliable machine and is suitable for the production of high-precision etching and ashing processes. The tool is designed for process repeatability, and is equipped with a variety of sensors and diagnostic tools to ensure consistent results every cycle. The asset is also designed to minimize downtime with a selectable restart capability. AMAT / APPLIED MATERIALS DPS II Etcher/Asher is the perfect solution for users who require a reliable, repeatable etching/ashing model for their production processes. It provides precise etching results and offers the highest levels of process control and throughput. The equipment is easy to use, designed for repeatability, and provides enhanced plasma quality for higher yields.
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