Used AMAT / APPLIED MATERIALS DPS II #9205693 for sale

AMAT / APPLIED MATERIALS DPS II is an advanced asher/etcher system, designed for the fabrication of integrated circuits. This machine is used to etch and clean wafers through chemical or plasma activated reactions. It has several distinct advantages, including an advanced design and high throughput, as well as full compatibility with a range of substrates and materials. AMAT DPS II is equipped with an efficient and robust structure that allows for a high output band. The machine consists of a main vacuum chamber, equipped with a number of independently operated heads that can each host a wafer during the process. It includes a single in-line or dual-loop process chamber, which is capable of wafer cleaning and an integrated wafer track for precise positioning of the wafers. APPLIED MATERIALS DPS II also features an advanced, user-friendly graphical user interface, allowing for easy and intuitive operation. The system is capable of running in either manual or automated modes, allowing for flexible control over the etching and ashing process. Its user friendly operator interface also allows for quick diagnostics and the generation and editing of process recipes. An important advantage of DPS II is its wide range of process capabilities, allowing for high quality process results from a variety of substrates and materials. This is due to its comprehensive process library, which includes etching, ashing and wafer cleaning. This ensures that each wafer is treated for optimal results. The system also provides unique features such as accurate temperature control, fast stabilization and wafer cooling. Additionally, AMAT / APPLIED MATERIALS DPS II is featured with multiple gas valves, allowing for a large selection of etching and cleaning gases to be used for both single-sided and dual-sided etching. AMAT DPS II is an advanced, highly efficient etcher and asher, designed for the most demanding wafer processing operations. It provides the versatility and flexibility to meet the needs of all process requirements, and features a simple user-friendly graphical user interface.