Used AMAT / APPLIED MATERIALS DPS II #9255367 for sale

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Etchers / Ashers
Manufacturer
AMAT / APPLIED MATERIALS
Model
DPS II
ID: 9255367
Wafer Size: 12"
Poly etcher, 12" ADVANCED ENERGY Navigator 3013 Source matcher, 3155132-004 ADVANCED ENERGY Navigator 1513 Bias matcher, 3155126-020 ADVANCED ENERGY APEX 3013 Source generator, 3156113-006 ADVANCED ENERGY APEX 1513 Bias generator, 3156110-005 ALCATEL / ADIXEN / PFEIFFER A100L Load lock pump PC: Pentium 4 Chamber A, B and C: ESC, 0041-26723 Ceramic lid, 0200-06404 Hub, 0200-04969 Gas nozzle, 0050-88146 Quartz single ring, 0200-04619 Insulator, Quartz, 0200-36034 Lower chamber liner, 0040-43977 Upper chamber liner, 0040-81156 Cathode liner, 0021-26273 Plasma screen, 0021-26274 Lift pin, 0200-04593 Plasma screen screw cover, 0200-00933 SLD Door, 0020-89739 TGV, 0190-29611 High voltage module, 0190-23905 Lid heater, 0090-04235 FE-ICP, 0010-37963 Source outer coil capacitor, 0630-00665 TGN Gas line, 0050-88146 Gas nozzle lower clamp, 0041-10491 Gas nozzle upper clamp, 0041-10490 PCB Water leak detector, 0190-02076 Interlock module, 0190-17964 CPCI 3U Quad serial communication, 0190-23509 CPCI48 Digital 48 I/O, 0190-07450 CPCI 32/16 Analog 32/16 I/O, 0190-22967 Dnet BUS scanner, SST CPCI, 0190-16926 SBC C400MHZ 3U 4HP 64M RAM Vx works, 0190-24007 One slot 3U Power supply, 0190-07502 Helium controller (IHC) assy, 0010-07061 Heater controller, 0190-26495 EyeD SRM, 0190-28658 EyD Fiber optic cable, 0190-19764 EPD Window point, 0200-02160 Manometer window port, 0200-39135 Chamber D: Throttle valve, 3870-03335 SLD Door, 0040-47461 Temperature controller, 0010-19317 Interlock module axiom, 12", 0190-15733 DIP Board, 0190-07450 AIO Board, 0190-22967 D-Net scanner board, 0190-16926 SBC Board, 0190-24007 Power supply board, 0190-07502 Serial communication board, 0190-23509 Pedestal, 0010-34860 Lift pin, 0021-43884 Top cap, GDP, Axiom HT, 0200-02980 Liner, side GDP, Axiom HT, 0200-02981 Lower GDP, HT2, Axiom, 0200-02272 Insert quartz glass, 3350-00048 Single ring, 0020-47977 Gas configuration: Chamber A: Gas / Name / Size Gas01 / BCL3 / 200 Gas02 / HBR / 500 Gas03 / CHF3 / 200 Gas04 / CL2 / 200 Gas05 / NF3 / 100 Gas06 / O2 / 200 Gas07 / O2S / 20 Gas08 / SF6 / 50 Gas09 / CF4 / 300 Gas10 / N2 / 500 Gas11 / HE / 500 Gas12 / AR / 500 Chamber B: Gas / Name / Size Gas01 / BCL3 / 200 Gas02 / HBR / 500 Gas03 / CHF3 / 200 Gas04 / CL2 / 200 Gas05 / NF3 / 100 Gas06 / O2 / 1000 Gas07 / O2_S / 20 Gas08 / SF6 / 50 Gas09 / CF4 / 300 Gas10 / N2 / 500 Gas11 / HE / 500 Gas12 / AR / 400 Chamber C: Gas / Name / Size Gas01 / BCL3 / 200 Gas02 / HBR / 500 Gas03 / CHF3 / 200 Gas04 / CL2 / 200 Gas05 / NF3 / 100 Gas06 / O2 / 300 Gas07 / O2_S / 20 Gas08 / SF6 / 50 Gas09 / CF4 / 300 Gas10 / N2 / 300 Gas11 / HE / 500 Gas12 / AR / 500.
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AMAT / APPLIED MATERIALS DPS II is an inductively coupled plasma (ICP) etch equipment. It is a high-end, large-scale, inductively coupled etch (ICE) system, with features like single-vessel batch etching, high process uniformity and high throughput. AMAT DPS II is a top-of-the-line etch unit, featuring four flow-through chambers, integrated into the machine. These chambers are designed to etch a variety of materials, including organic dielectric and metal films, as well as hardmask, epitaxial and wafer resistive layers. The tool can be configured to etch in either a single or multiple chamber mode, with up to four layers simultaneously. APPLIED MATERIALS DPS II also features advanced process control technology, with an integrated database based on recipes from customers and OEMs. This enables the asset to achieve good etch uniformity, high throughput and well-defined process parameters. DPS II has a wide range of etching chemistries, from CF4-based ‘hard mask’ etch and XeF2-based resist-etch to microwave-based carbon etch. The chemistry capability and flexibility of this model allows users to etch a variety of materials, ranging from Silicon to GaAs and beyond. AMAT / APPLIED MATERIALS DPS II also features an advanced voltage source Intelligent Power Supply, which provides adjustable power, frequency and compensation capability to enable precise, repeatable etches. The equipment can be integrated with a variety of process simulation software tools, providing a precise virtual model of the etch process and assisting with process optimization. AMAT DPS II has proven itself to be an important tool in the fabrication of microelectronic and optoelectronic components. Its flexibility, user-friendly interface and high-level process capability make it a valued part of the complex process required in fabricating high-performance, reliable components for semiconductor and opto-electronic applications.
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