Used AMAT / APPLIED MATERIALS DPS II #9379759 for sale
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AMAT / APPLIED MATERIALS DPS II is an advanced, state-of-the-art etcher / asher tool. Using advanced plasma technology, the equipment is designed for both high-precision etching and ashing of various materials, from metals to semiconductors. As well as efficient etching/ashing of a wide variety of materials, AMAT DPS II offers superior process control with precise parameter adjustment for optimal etch or ash. This allows users to attain high process repeatability, achieving high-aspect ratio structures while maintaining better-than-expected surface quality. APPLIED MATERIALS DPS II is engineered with high-output power, excellent long-term process stability, as well as high wafer throughput, enabling users to achieve the highest wafer surface yield. Its ease-of-use and user-friendly design help operators to maximize productivity. DPS II contains a high-pressure, low-pressure, and vent-pressure chamber. The high-pressure chamber is designed for high-rate etching and reliable reproducible etching with low sputter back scatter onto the wafer edge. The low-pressure chamber serves as a pre-clean chamber prior to etching and as an asher with a two-zone process for superior uniformity. AMAT / APPLIED MATERIALS DPS II also has a built-in temperature control system that helps stabilize the process temperature and thus improves etching/ashing repeatability and uniformity. In addition, the unit also has a static neutralizer to prevent the accumulation of positive ions on the surface of the wafer while etching or ashing, as well as a grounded wall to further reduce potential electrical charging. AMAT DPS II has proven to be a reliable tool in the fabrication of high-performance circuits and can also be used for advanced MEMS (micro-electro-mechanical machine) applications. Its robust design and user-friendly interface allow users to achieve superior etching and ashing performance with minimum operator intervention. The tool is reliable, repeatable, and extremely user friendly. It provides high-precision etching and ashing results even on challenging materials, making it an ideal tool for device fabrication.
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