Used AMAT / APPLIED MATERIALS DPS Poly #9303002 for sale

AMAT / APPLIED MATERIALS DPS Poly is an etcher/asher primarily used within the semiconductor manufacturing industry. It consists of a heated polyethylene transport tank that delivers wafers within a chemical-vapor-deposition (CVD) chamber. This chamber is equipped with a pre-heater, an RF generator, substrates, and a match coil as well as other components. AMAT DPS Poly has multiple processes within a single chamber that enable it to deliver superior etch and deposition process results. This equipment features dual-head, reactive ion etching (RIE) technology, as well as a chemical-mechanical-polishing (CMP) process for enhancing semiconductor surfaces. The two separate head designs within the system allow for etching of metal and dielectric layers at the same time. The unit also includes a programmable controller that allows the user to program various etching profile steps, as well as the temperature and pressure of the chamber. This enables precise control of the etching and deposition process by setting temperature, pressure and RF power level. The RF generator produces both a steady-state and pulsed RF during plasma etching operations. The match coil, which can be adjusted by the program controller, is used to control route to route impedance variability during plasma etching operations. To increase the throughput of APPLIED MATERIALS DPS Poly, AMAT implemented the "Substrate Cascade Loader". This allows for two substrates to proceed through any given process at the same time. This method has been known to reduce overall processing time drastically. The software developed by APPLIED MATERIALS for DPS Poly is also easy to use. It features an intuitive graphical user interface that can be used to quickly enter recipes for each etching or deposition process. This software also provides real-time monitoring of the chamber temperature, pressure, and RF power levels. In conclusion, the features of AMAT / APPLIED MATERIALS DPS Poly etcher/asher make it a great choice for anyone looking for a multifunctional machine that can handle both deposition and etching processes. It offers robust features such as the substrate cascade loader, dual head RIE, and the programmable controller, as well as easy-to-use software. These features have made AMAT DPS Poly one of the most widely used machines in the semiconductor industry.