Used AMAT / APPLIED MATERIALS DPS #9270844 for sale

An AMAT / APPLIED MATERIALS DPS (Deep Silicon Etch) Asher is a specialized etching equipment commonly used by the semiconductor industry. It is specifically designed to deliver highly precise and accurate etching processes for deep silicon-based etching applications. The system utilizes a high-frequency RF driven inductively coupled plasma (ICP) source to achieve deep etching of silicon materials. In general, AMAT DPS systems consist of a chamber, controller, and associated hardware. The chamber is an all-metal cylinder vacuum chamber, which is capable of achieving high pressures and temperatures. Also, it is designed to accommodate a silicon wafer and provides a space for the ICP source. The controller provides process control and monitors the different aspects of the etch process, such as vacuum levels, gas pressures, temperatures, and RF power output. These are all connected together and form the backbone of the etcher. The etching process starts with the wafer being loaded into the chamber. Next, a gas mixture is introduced into the chamber, as well as a high-frequency RF signal. This RF signal is responsible for heating up the ICP source, which then forms a plasma, creating a reactive environment in the chamber. The RF signal helps to cause ion bombardment of the silicon wafer, which breaks the bonds of the material and leads to etching. In addition, the unit is engineered to ensure efficient gas utilization. It also allows for in-situ monitoring of the etch process along with the ability to quickly adjust process parameters. The controller also enables several other functions like pre and post-etch cleaning, wafer temperature and orientation control, post-etch metrology, wafer tailoring, recipe generation among other key processes. Overall, APPLIED MATERIALS DPS systems offer highly uniform, precise etching at an acceptable rate, while avoiding nucleation, sparking, or other issues commonly found in deep etch applications. The machine provides an efficient and reliable solution for the precise etching of silicon materials for the semiconductor industry.