Used AMAT / APPLIED MATERIALS DPS2AE #293603812 for sale
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AMAT / APPLIED MATERIALS DPS2AE Etch/Asher Equipment is an advanced plasma dry etching system designed to provide high-performance etching processes at a submicron precision level. It is a reliable, easy-to-use tool that is suitable for both research and production applications. AMAT DPS2AE Etch/Asher Unit is a high-end plasma dry etching machine that features integrated planar magnetrons, a computer-controlled gas mass flow delivery tool, and a high-pressure dual-chamber design. This asset is ideal for etching a wide range of semiconductor materials, including silicon-based materials, SiGe, and GaAs. The model also supports statistical process control, allowing users to automate their process sequences and improve quality assurance. APPLIED MATERIALS DPS2AE Etch/Asher Equipment is designed to achieve the etching requirements of today's advanced semiconductor fabrication technique. Its dual-chamber design offers precision and well-balanced process control, and its high-speed switching valves ensure real-time reaction to etch process conditions. The system's in-situ control is also capable of optimizing etch process parameters according to user-defined specifications. DPS2AE Etch/Asher Unit uses advanced software to facilitate its operation. The user interface contains detailed parameter entry, gap recognition, process sequence programming, and data logging. This software also provides for automatic etch recipes for the most challenging process requirements. AMAT / APPLIED MATERIALS DPS2AE Etch/Asher Machine is capable of achieving high etch quality with very low particle generation. It also offers excellent material compatibility and can repeatably etch aluminum-containing layers. This tool can provide sufficient etch uniformity and can be used in a variety of process steps, including etching of shallow trenches, blackout/overfill etching, and planarization. Finally, AMAT DPS2AE Etch/Asher Asset offers excellent process consistency. It provides process repeatability, stability, and end-point control, delivering the precision and accuracy needed for highly critical etching tasks. The model also reduces hazardous wastes, making it an environmentally friendly solution. Combining all these features, APPLIED MATERIALS DPS2AE Etch/Asher Equipment is a reliable, high-performance system for etching and ashing semiconductor materials.
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