Used AMAT / APPLIED MATERIALS EFEM for etcher #9376103 for sale

AMAT / APPLIED MATERIALS EFEM for etcher is a full featured etching equipment designed to meet the needs of a variety of industries. With high throughput, precise layer thickness control, and low consumption of consumables, the EFEM provides a flexible and affordable solution for high-precision etching applications. The EFEM system includes a vacuum chamber that is capable of etching multiple wafer sizes, with a two-axis mechanical stage to facilitate the placement of wafers in the chamber. An RF generator supplies power to the chamber, which is used to etch the material on the wafer surface. A gas box provides a controlled atmosphere for the etching process, and a vacuum manifold regulates the chamber pressure and flow. The EFEM also features a load-lock unit to allow wafers to be loaded and unloaded from the chamber. This machine eliminates human contact with the etching chamber, which helps reduce airborne particles and improves the etching results. In addition, the load-lock tool allows the user to process multiple wafers in a sequence, improving throughput and enabling efficient processing for high-accuracy etching. The asset is designed to be very efficient and productive, with high-efficiency RF generators and a low-consumption gas box. The RF generators provide excellent etch rates and uniformity, ensuring that the end product meets the highest quality standards. The gas box consumes low amounts of consumables, reducing the costs associated with the etching process. The EFEM is equipped with a built-in metrology model, allowing users to measure various parameters such as etch rate, critical dimension (CD) control, thickness control, and layer surface quality. This equipment enables users to monitor the etching process and adjust parameters to achieve the desired etch performance. AMAT EFEM for etcher is an excellent choice for cost-effective production of high-precision etchings. It is designed to be reliable, efficient, and accurate, and provides excellent layer control, uniform etching, and fast throughput. The system's advanced technology and features make it an ideal choice for companies looking for an economical and reliable etching solution.