Used AMAT / APPLIED MATERIALS eMax CT+ #9189026 for sale

AMAT / APPLIED MATERIALS eMax CT+ is a precision dry etch and asher solution designed to provide precise results in semiconductor fabrication processes. This powerful integrated dry etching and asher system features an advanced plasma process and wafer transfer automation, both of which enable higher productivity and improved uniformity. The system utilizes a revolutionary plasma process that combines low pressure, high power, and magnetic field references in a single chamber. This provides a unique combination of higher etch selectivity, excellent uniformity and higher throughput. The automated wafer transfer then ensures that each wafer is accurately placed in the etch chamber and, with the addition of multiple stages, ensures that the etching and ashing processes are completed with precise control of both total etch time and etch repeatability. Additionally, the integrated closed-loop modules offer a level of automation and flexibility that makes AMAT EMAX_CT+ the perfect solution for rapid manufacturing and processing of a variety of hard materials in the semiconductor industry. By utilizing the closed-loop modules, etch parameters such as pressure, bias and power can be automatically tuned to the desired performance criteria. This provides consistent results regardless of chamber temperature or the number of wafers that are being processed. Furthermore, the chambers are designed to maintain uniformity even when processing varying wafer sizes, thus ensuring high levels of yield and repeatability. Integrated visualization and optimization tools make APPLIED MATERIALS E-MAX CT+ the most precise dry etch and asher solution on the market. Platform-dependent diagnostics within the control unit allow for real-time monitoring of etch selectivity and wafer temperatures. This means that any issues with plasma process parameters can be quickly and accurately identified and rectified. Additionally, integrated analytical tools such as Monte Carlo analysis and 2-dimensional simulation provide operators with detailed system analysis so that the most optimal conditions for performance can be identified quickly and with minimal operator intervention. With its combination of advanced plasma processing techniques, automated wafer transfer, and integrated diagnostic and optimization tools, AMAT E-MAX CT+ is the ultimate choice for precise etching and ashing processes in the semiconductor industry.