Used AMAT / APPLIED MATERIALS eMax CT+ #9261583 for sale

AMAT / APPLIED MATERIALS eMax CT+ etcher/asher is a high-performance, semi-automated processing equipment developed for advanced semiconductor device manufacturing. It offers superior capabilities for precision etching and cleaning processes. The system utilizes halogen-based etching and ashing methods to achieve the highest level of performance at cost effective rates. With its patented gas cabinet technology, the etcher/asher is able to reliably etch semiconductor materials without the need for expensive, cumbersome manual processes. The unit is highly automated, featuring automated process control and an intuitive user interface. Some of the key features of AMAT EMAX_CT+ etcher/asher include: low temperature gas capacitance, quick cycle time, and low power consumption compared to conventional processing systems. The machine utilizes advanced etching features, such as reactive ion etching (RIE), to precisely shape and form the necessary features in the semiconductor materials. Using tight process control settings, APPLIED MATERIALS E-MAX CT+ etcher/asher can etch gate oxide layers thinner than 9 nm and finer patterns than 10µm. Programmable process recipes also allow users to optimize yields and reduce cycle times for complex processes. The use of halogen species enables the tool to etch heavily doped materials with negligible risk of shorting. Built-in safety features include overload protection, water-level detection, and a 50mm ozone safety barrier. The halogen process cabinet utilizes refrigerated dryer technology to provide clean process gas, increasing the etch performance of the asset. An open process chamber enables complete accessibility of the wafer, allowing for quick and easy maintenance of the our etcher/asher. The model features a compact and robust design, and can be easily integrated into a variety of existing semiconductor manufacturing environments. APPLIED MATERIALS EMAX_CT+ etcher/asher is a valuable tool for semiconductor fabrication, providing superior performance and cost efficiency. With its state-of-the-art etching and ashing capabilities, the equipment is able to meet the most stringent requirements of advanced semiconductor processes. Its features allow for the reliable manufacture of high yield and high performance integrated circuits.