Used AMAT / APPLIED MATERIALS eMax CT+ #9408194 for sale

Name: AMAT / APPLIED MATERIALS eMax CT+
Brand: AMAT / APPLIED MATERIALS
SKU: 9408194
Availability: InStock

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Photo Used AMAT / APPLIED MATERIALS eMax CT+ For Sale

Etchers / Ashers

Manufacturer

AMAT / APPLIED MATERIALS

Model

eMax CT+

ID: 9408194

Oxide etcher, 12" TM Module (3) PM Modules AC Rack RF Rack FI (EFEM): FI Type: 5.3 FI MF Platform type: AP SUPERMICRO GEN3 0090-06587 Server SUPERMICRO GEN3 0090-06584 Server EATON Powerware 5115 UPS, P/N: 0190-26019 MKS MACRONODE 0190-22543 FI Ethernet digital I/O Keyboard video mouse, P/N: 0190-05111 D-LINK 0190-39904 Ethernet switch hub (24-Ports) Sealevel, P/N: 0190-22545 Fast Data Gateways (FTG), P/N: 0010-25273 Fast Data Gateways (FTG), P/N: 0010-25274 Short flex controller assy, P/N: 0090-06516 Scanner board short flex controller assy: SST DNET Scanner board, P/N: 0190-34513 MEI XMP Board, P/N: 0190-24445 SBS Serial board, P/N: 0190-11817 GE SBC Board, P/N: 0090-06299 (2) TAKEX SS20-TR40 Light curtains (3) TDK TAS300 Load ports (3) OMRON V640-HAM11-V2-1 RFID YASKAWA XU-RCM6801 ATM Robot YASKAWA XU-ACP4860 Aligner, P/N: 0190-14752 YASKAWA XU-ACL4230 Track, P/N: 0190-14739 YASKAWA XU-CN1170A Robot controller, P/N: 0190-23873 YAMATAKE 0190-24680 Gas panel temperature controller Intake plenum enclosure MF Platform: NSK VHP TM Robot NSK ELA-B014CG1-04 TM Robot controller (2) Cermic dual blades: Low shoe type ALCATEL A100L Single I-pump MKS 124AA-00010BB TM Baratron gauge: 10TORR GRANVILLE-PHILLIPS 275 Mini-convectron TM vacuum gauge: 10TORR (2) GRANVILLE-PHILLIPS 275 Mini-convectron load lock vacuum gauges: 10TORR (2) PANASONIC MQDB011AAD03 Load lock indexer controllers, P/N: 0190-19214 (2) Load lock diffusers STM Diffuser (2) Load lock vent valves MKS 640 Auto Pressure Controller (APC): 10TORR VAT 0190-03234 Slit valve GME Chamber port assy Lid, P/N: 0242-23452 Modular DNET IO controller (MDI): Modular, P/N: 0190-01898 MF Interlock relay, P/N: 0190-02362 MF Interlock relay, P/N: 0190-02363 Loadlock interface, P/N: 0090-01809 Mainframe interface, P/N: 0090-01810 CDN494 IO, P/N: 0190-04745 Analog power, P/N: 0190-01971 Process chamber: A, B and C: Chamber Control Modules (CCM): TENTA 0190-02076 Water leak detector board Interlock board, P/N: 0190-07052 (2) MKS 0190-23509 Quad serial boards (2) TENTA 0190-07450 Digital I/O boards MKS 0190-22967 Analog I/O board SBS 0190-22255 IP Carrier board SST 0190-16926 Devicenet scanner board TENTA 0190-24007 SBC Board, 400 Mhz TENTA 0190-07502 Power supply board Shower head, 16" Chamber liner Cathode liner Slit liner door KOLLMORGEN MAG Driver, P/N: 0190-17272 ESC High Voltage Module (HVM), P/N: 0010-16690 NORCAL TPV200 Throttling gate valve, P/N: 0190-25400 NORCAL TPV200 Throttling gate valve, P/N: 0190-25401 Embedded endpoint, P/N: 0010-10663 Ceramic puck, P/N: 0040-63474 MKS DPC HE Controller, P/N: 0010-29436 Vacuum gauges: MKS Dual range process manometer, P/N: 1350-00201 GRANVILLE-PHILLIPS 275 Mini-convectron foreline vacuum gauge, P/N: 3310-01200 Vacuum switches: MKS 41A-21439 ATM Switch, P/N: 0190-01901 MKS 51A-21440 ATM Switch, P/N: 0190-01902 ALCATEL ATH1600M Master turbo pump ALCATEL ATH1600M Slave turbo pump ALCATEL ACT1300M Master turbo pump controller ALCATEL ACT1300M Slave turbo pump controller NORCAL 3870-01455 ISO Valve NORCAL ESVP-1503T-NWB-CR ISO Valve, P/N: 3870-03304 ADVANCED ENERGY Ovation 2760 Source RF generator, 0190-17779 DAIHEN RMN-50N1 RF Bias match box, P/N: 0190-15322 DAIHEN AMN-30H RF Source match box, P/N: 0190-15323 Gas panel for chamber A, B and C: Mass Flow Controllers (MFC): Size / Make / Model 200 SCCM / CELERITY / AASGD40W1 200 SCCM / SAM / 2480G1 100 SCCM / CELERITY / AASGD40W1 300 SCCM / BROOKS AUTOMATION / GF-125C 20 SCCM / CELERITY / AASGD40W1 20 SCCM / CELERITY / AASGD40W1 20 SCCM / CELERITY / AASGD40W1 100 SCCM / CELERITY / AASGD40W1 1000 SCCM / BROOKS AUTOMATION / GF-125C 200 SCCM / CELERITY / AASGD40W1 1000 SCCM / BROOKS AUTOMATION / GF-125C 200 SCCM / CELERITY / AASGD40W1 Mass Flow Controller (MFC) for chamber A and C: Size / Make / Model 200 SCCM / CELERITY / AASGD40W1 MKS FRCA-29015 Flow Ratio Controller (FRC): Size: 1000 SCCM Type: NEXTGEN 14-Sticks Weldment type: Single line drop Etch lean AC power rack, 12" Power: 600A Front: 0195-03727 Rear: 0195-03728 (3) ENI GHW-50 RF Bias generators P/N: 0190-15319 Frequency: 13.56 MHz (3) MKS B-5002 RF Bias generators P/N: 0190-15320 Frequency: 2 MHz Spare parts: (3) UNISEM RPT6200A Chillers (3) 13.56 Mhz RF Coaxial cables (79FT), P/N: 0620-02935 (3) 2 Mhz RF Coaxial cables (79FT), P/N: 0620-03165 CHX 485 Communication cable (3) MAG Driver contactor cables, P/N: 0150-11950 EMO Interconnect 50FT cable, P/N: 0150-02438 (3) RGJP, P/N: 0150-15149 (3) Pump umbilicals, 75FT cable, P/N: 0150-35744 (3) Chamber cooling manifolds, P/N: 0190-22819 (3) E-FIB Insert, P/N: 0190-23662 Monitor rack Gas panel SLD Bottom cover Gas panel exhaust duct FI Intake plenum Enclosure IPUP Mobile worksation (3) SUS Pads.

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AMAT/APPPLIED MATERIALS AMAT / APPLIED MATERIALS eMax CT+ is a high-performance plasma etcher/asher equipment designed to handle a variety of applications. The system offers multiple process modules to meet the demands of each application. AMAT EMAX_CT+ operates with a patented high density DC (direct current) plasma source to ensure low etch rates and consistent process results. The unit also features a multi-stage RF (radio frequency) bias power supply for increased selectivity and process control. APPLIED MATERIALS E-MAX CT+ also features dual-chamber process chambers to provide faster throughput and improved process yields. The high density DC plasma source of eMax CT+ can generate plasma sources from 10 - 400 watts, while the RF bias power supply has a maximum output power of up to 25 kilowatts. The source can also be configured to meet a variety of needs, with a variety of gas mixes including Bas, BrF2, F2 and more. The process chamber of AMAT / APPLIED MATERIALS EMAX_CT+ is equipped with a variable-area metal perforated gas showerhead to ensure precise gas distribution, along with an automated proportional valve for precise control of the gas flow rate. AMAT eMax CT+ utilizes advanced process control technology, featuring pulse control, pulse height analysis and advanced control algorithms. These features allow precise control of etch process parameters such as bias power, pressure, DC and RF power as well as EMAX_CT+ process chamber pressure. The machine can also be used for wafer uniformity measurements, as it is equipped with an Absolute Standard Pressure Chamber for calibration purposes. APPLIED MATERIALS eMax CT+ features an advanced user interface that provides a comprehensive and intuitive set of integrated controls to ensure maximum tool performance. In addition, an embedded Web server allows easy access and control of E-MAX CT+ over network connections. The asset also feaures an automatic self-diagnosis feature that can help reduce downtime when errors occur. Overall, AMAT / APPLIED MATERIALS E-MAX CT+ is a reliable plasma etcher/aser model designed to provide precise control and high throughput. The equipment alsofeautures high density DC and RF power sources, dual-chamber process chambers and an advanced user interface. With its advanced control algorithms and comprehensive set of controls, AMAT E-MAX CT+ is an ideal and cost-effective solution for etching and ashing applications.