Used AMAT / APPLIED MATERIALS G5 MESA HPK #293616964 for sale

AMAT / APPLIED MATERIALS G5 MESA HPK is a high performance etcher/asher designed for advanced semiconductor processing. It is capable of dry etching and ashing single or multiple layer films in a variety of materials such as polysilicon, SiO2, SiN, and polyimide. The machine features an advanced modular design which allows for compatibility with various process chemistries and etch recipes. The chamber size of the machine is 205 mm x 215 mm x 305 mm, and can handle wafers up to 200 mm in diameter. AMAT G5 MESA HPK is equipped with a fixed frequency RF generator and a manifold-gas equipment for optimal etch performance. It also features an advanced gas flow managements system that enables the operator to precisely control the gas pressure and gas flow. This unit eliminates the need for manual adjustments, thus reducing operator error. Additionally, the machine is compatible with many different chemistries which makes it suitable for a variety of applications. APPLIED MATERIALS G5 MESA HPK has a high pressure molybdenum etch chamber which provides a fast etch rate and uniform etching throughout the wafer. It is also equipped with high capacity pumps and controls which provide better control of process parameters and uniform etching within the machine. This ensures the high-quality performance of etching and ashing processes. G5 MESA HPK is also equipped with advanced diagnostic and maintenance tools. This helps operators understand the etching performance of the machine by gathering data that can be analyzed and applied for process improvement. It also has an automated diagnostics tool which can detect any hardware or software problems that may arise during an etching or ashing process. This helps to prevent downtime and unnecessary shutdowns. AMAT / APPLIED MATERIALS G5 MESA HPK is a highly modular, configurable and upgradable etcher/asher which provides accurate, high-performance, reliable etching and ashing processes. Its advanced diagnostic and maintenance capabilities ensure that etch performance is maximized and downtime minimized. Finally, its compatibility with different chemistries also makes it suitable for use in a variety of applications.