Used AMAT / APPLIED MATERIALS G5 #9263764 for sale

AMAT / APPLIED MATERIALS G5 is a precision etching/ashing tool used for semiconductor fabrication and packaging. It is designed for efficient photolithographic patterning, etching, and ash cleaning. AMAT G5 features an all-in-one design with an easy-to-use user interface and high throughput capability. It is also equipped with a low power-consumption and low maintenance design, as well as a variety of customizable processing options. APPLIED MATERIALS G5 offers semi-standard and wide bottom process chambers, making it suitable for various etching/ashing process requirements. It is based on radio frequency (RF) and plasma sources and is capable of both etching and ash cleaning to produce well-defined patterns in thin layers of dielectric material. Its controllable variable frequency range of 27-250kHz enables reliable and accurate etching of micron-level precision features. In addition, G5 offers superior wafer throughput and process uniformity. It features an embedded wafer-cassette and an integrated auto-load port designed to ensure that wafer transfer is always successful. Its automated wafer-handling system offers the flexibility to move wafers between different cassettes in under 10 seconds. Its adjustable wafer support suspension allows a wide range of wafer sizes to be processed. AMAT / APPLIED MATERIALS G5 is also equipped with several in-situ monitoring features that rapidly detect and identify low temperature and process non-uniformities. Its state-of-the-art gas distribution system provides precise and uniform flow rate control, as well as superior quality of gas-to-substrate conditions. Finally, its built-in safety and contamination prevention capabilities are enhanced via its "Hot Wall" plasma containment system and its "Active Surface Source Cleaning" feature. All in all, AMAT G5 is a powerful etching/ashing tool for reliable production of accurate and high-performance patterns in thin layers of material. Its highly efficient processing capability and robust engineering design makes it suitable for reliable etching/ashing of micro-sized features and short cycle times. APPLIED MATERIALS G5 also offers superior wafer throughput, reliable process uniformity, and easily adjustable pressure, temperature, and gas flow rate settings.