Used AMAT / APPLIED MATERIALS G5 #9270848 for sale

AMAT / APPLIED MATERIALS G5
ID: 9270848
System.
AMAT / APPLIED MATERIALS G5 is an asher/etcher equipment designed for precision etching or ash processing of wafers. This system utilizes a high-power, high-frequency plasma etching and ash process to quickly and accurately etch large or small batches of wafers. This process works to a depth accuracy of +/- 1um and can achieve a surface planarity accuracy of +/- 2um. AMAT G5 is specifically designed to be used in applications such as integrated circuit packaging, wafer thinning, dielectric etching, polyimide etching, and display production. APPLIED MATERIALS G5 unit features a computer-controlled, single chamber design with an enclosed gas cabinet. This design ensures that the plasma is precisely contained and the resulting ash is satisfied. The machine is also designed with intelligent operating parameters, which allow for more accurate, repeatable results. Additionally, G5 has been designed with a movable chamber wall and is able to accommodate substrates up to 300mm in size. AMAT / APPLIED MATERIALS G5 offers both wet and dry ash processing capabilities, which helps to further reduce the risk of particle contamination. The tool is equipped with a time-of-flight mass spectrometer for continuous in-process monitoring of particles and powered by AMAT advanced etch control software. This software includes an automated tuning cycle that adjusts process parameters to automatically maintain the highest possible performance. The software is also compatible with APPLIED MATERIALS Production Viewer software, which allows users to monitor processes from remote locations. AMAT G5 is an advanced asher/etcher asset designed for high-precision etching and ash processing of wafers. Its design ensures containment of the plasma etching and ash processes, while allowing for repeatable results. The model also features movable chamber walls and is equipped with wet and dry ash processing capabilities. Lastly, it is powered by a time-of-flight mass spectrometer and advanced etch control software, allowing users to monitor processes from remote locations.
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