Used AMAT / APPLIED MATERIALS G5 #9314557 for sale

AMAT / APPLIED MATERIALS G5 is an etcher/asher that is designed to operate in the ultra-high vacuum range for plasma etching processes. This tool uses ionized gas for etching and ashing applications, and can be configured to perform both dry and wet etching processes. The capacitively-coupled radio frequency (RF) technology used in AMAT G5 allows it to etch a variety of materials such as silicon, germanium, quartz, and diamond. This etcher/asher comprises a process chamber, a vacuum equipment, RF generator, power supply, gas inlets, exhaust systems, and a controller. The process chamber is designed to be leak-tight and uses a vacuum system to maintain ultra-high vacuum levels during operations. The RF generator incorporated into the tool produces an RF power that acts as a source of energy for the etching process by ionizing the gas molecules. Furthermore, the device uses a power supply to maintain and control the RF power. APPLIED MATERIALS G5 can be used for a variety of applications, including material removal, surface cleaning, and plasma-assisted deposition. It is capable of etching a range of materials, including semiconductors, quartz, and diamond. This tool supports etching with chemistries such as fluorine-based CF4, Ar/CF4, CHF3, and Ar/Cl2, with higher etch rates. The deep etching capability of this tool allows for features less than 10nm accuracy. To ensure the highest quality etching, G5 incorporates thermal insulation and cooling systems. The tool is also designed for easy maintenance and can be manually operated or programmed for automatic operation. Furthermore, this unit uses a closed loop control machine to monitor pressure and temperature during the etching process. AMAT / APPLIED MATERIALS G5 is a reliable and versatile etching and ashing tool that is suitable for a variety of processes including MEMS device fabrication, semiconductor device manufacturing, microfluidics, and process research. It is available in multiple sizes to meet different application needs and is available as a tabletop model or as a complete tool. This tool offers high process repeatability and accuracy, making it an ideal choice for many advanced etching and ashing processes.