Used AMAT / APPLIED MATERIALS Metal chamber for Centura DPS II 532 #293665695 for sale

AMAT / APPLIED MATERIALS Metal chamber for Centura DPS II 532 (an etcher/asher) provides precise and repeatable process control and precision etch and ashing of the materials integral for semiconductor and MEMS device fabrication. The chamber is constructed of a triple-layer bonded stainless steel assembly providing superior corrosion resistances and thermal regulation in a robust and durable manner, allowing for excellent repeatable performance over extended periods of use. The chamber has a volume of 5.32 liters (1.4 gallons) and operates at up to 230 degrees Celsius (446 degrees Fahrenheit). The chamber is designed with an innovative triple chamber overlapping lids design that provides the user with an unsurpassed combination of performance, precision and durability. The overlapping lids ensure uniform distribution of process parameters, while providing a larger process space for improved thermal control and uniformity. The Centura DPS II 532 chamber features electronic flow control, temperature, pressure, flow uniformity, gas purge and fan speed and shift settings to monitor and control processes. Additionally, the chamber provides precise plasma uniformity and uniformity of processing end points. The chamber also has an integrated quartz side shield, an inertia-drive shutter, process gas flow and control exhaust, and is capable of high alcove as well as low alcove power delivery. The Centura DPS II 532 also has advanced plasma control technology that can be programmed for exothermic and endothermic process control, providing optimal wafer uniformity and repeatability. The advanced plasma control increases throughput while being able to maintain a low etch rate and high throughput. In addition to the advanced plasma control, the Centura DPS II 532 features a multi-layers fluorocarbon seal system, which can ensure an overpressured environment and prevent any acid atmosphere from entering or leaving the chamber. This provides excellent process stability and consistency. The Centura DPS II 532 is designed to meet the ever-changing needs of the semiconductor, MEMS, and fabrication markets. From resist strip, thin film etch/ash and passivation, to patterning and high aspect ratio etch/ash, the Centura DPS II 532 provides the precision and repeatability to ensure the highest quality and consistent end products.