Used AMAT / APPLIED MATERIALS P5000 Mark II XT Optima #9213667 for sale

AMAT / APPLIED MATERIALS P5000 Mark II XT Optima is a precision etcher/asher designed for finer dimensional control and consistency in high-volume manufacture of photonic, microelectronic, and semiconductor components. It utilizes an electrochemical reaction to assist in the deposition of thin films of conductive and non-conductive metals, oxides, and nitrides on a semiconductor wafer surface, allowing for photonic and electronic applications. AMAT P5000 Mark II XT Optima etcher/asher is a compact and modular system constructed from a variety of materials, including vacuum-grade stainless steel, die-cast aluminium, and advanced polyester-based composites. An integrated laminar flow chamber provides a dust and particle-free environment to promote precision etching and ashing processes. This closed system includes integral environmental and safety monitoring systems to ensure hazardous gasses and particles are contained and the work environment is safe. APPLIED MATERIALS P5000 Mark II XT Optima utilizes multiple advanced etching and ashing processes to produce high-precision, high-quality parts and components. Its electrochemical etching and ashing processes involve the use of a dilute, aqueous solution of reactive chemicals and an electrical current to dissolve and/or oxidize materials on a surface in order to create thin films or remove unwanted materials. Depending on the needs of the project, multiple etching and ashing techniques can be used at the same time to produce better results. The core of P5000 Mark II XT Optima is an electron beam evaporator module capable of producing highly precise and controlled nanopatterns, nanostructures, and nanowire metallization. It features an ion source as well as a quartz deposition chamber, and can be configured for high-power etching and ashing. The system also includes a gas distribution unit to provide the necessary aerosol deposition gases, a vacuum subsystem to evacuate air from the chamber, and a high-precision motion control module to achieve precise dimensions. AMAT / APPLIED MATERIALS P5000 Mark II XT Optima utilizes a range of etching and ashing solutions to create structures including nanowires, nanopatterns, and nanostructures. Its high-precision multilevel etching and ashing techniques allow for precise control of the thicknesses of the film layers. The integrated laminar flow chamber greatly reduces the amount of dust and particles, while its advanced safety and environmental monitoring systems ensure a safe working environment. The modular construction and precision etching and ashing processes of AMAT P5000 Mark II XT Optima make it a reliable and efficient choice for high-volume manufacture of semiconductor, microelectronic, and photonic components.