Used AMAT / APPLIED MATERIALS Plasma II #293604234 for sale

AMAT / APPLIED MATERIALS Plasma II Asher/Etcher is an industrial equipment used for cleaning and etching substrates. This system is comprised of a sealed chamber, with a power supply, controls, and a gas delivery unit. The chamber is cooled by a gas circulating machine that keeps the chamber at a low temperature, which helps prevent oxidation and allows for improved process control. The tool is designed to deliver a precise and repeatable plasma etch process. The etching process involves the use of high frequency radio frequency (RF) energy to convert a gas, typically a combination of argon, oxygen, and fluorine, into a plasma. The plasma is then directed to the substrate, where it etches away the impurities, providing a clean and uniform surface. The power supply used in AMAT Plasma II Asher/Etcher is designed to deliver high RF energy and is available in a wide range of frequencies, including 13.56 MHz, 2.45 GHz, and 27 MHz. This allows users to customize the etching process to their specific needs. The power supply also allows the user to set the plasma power level, allowing them to control the depth of etching. The Gas Delivery Asset is used to control the type and quantity of gas used in the etching process, and is capable of delivering both high and low gas pressures. This allows for adjustments to be made for different etching processes. The gas flow rate is adjustable, as well as the type and purity of the gas used. The controls must also be set up properly to ensure that the etching process takes place as desired. The user can set various parameters, such as process time, gas flow rate, plasma power and on-screen instructions for changing the process conditions. APPLIED MATERIALS Plasma II Asher/Etcher is capable of producing excellent results, providing users with a clean and uniform etched substrate, with no variation between parts. This model is able to etch various materials such as Silicon, Glass, and Quartz, providing a wide variety of uses. It is a reliable equipment with low maintenance requirements, making it ideal for a variety of etching processes, both in research and industrial laboratories.