Used AMAT / APPLIED MATERIALS PVD HTHU #179312 for sale

AMAT / APPLIED MATERIALS PVD HTHU is an etcher/asher used for thin film deposition and other surface modifications in a vacuum environment. The equipment is specifically designed for high precision substrate processing such as etching and ashing, deposition of thin films, oxide layer deposition, and passivation of IC devices. AMAT PVD HTHU system is composed of 2 primary components, the etching or ashing chamber and the vacuum unit. The etching or ashing chamber is a stainless steel enclosure which houses the process gases, substrates, and other processing equipment. It is designed to support high temperature substrate processing and conform to cleanroom and safety compliance standards. The vacuum machine is used to regulate the pressure and flow of gases through the etching/ashing chamber. It consists of a vacuum pump, pressure sensors, and valves for pressure control. APPLIED MATERIALS PVD HTHU utilizes a unique technology called hybrid thermal processes (HTHU) to deposit or etch thin films and other materials. In this process, a combination of heat and plasma is used to either deposit or etch the films. The substrate is heated to near-melting temperatures while a plasma is generated which further helps etch or form films on the substrate surface. This process is repeated multiple times to create the desired properties. The resulting films or patterns are very thin and precisely controlled. PVD HTHU can also be used for other substrate surface modifications such as oxide layer deposition, passivation, and adhesion. These processes are all performed in the same etching/ashing chamber with the same vacuum tool. This enables integrated and effective surface modifications for many device fabrication processes. AMAT / APPLIED MATERIALS PVD HTHU is an advanced etching/ashing asset that offers precise and reliable substrate processing for the modern fab environment. It is designed for high precision processing, available for many substrate materials, and can be used for various thin film deposition and other surface modifications. AMAT PVD HTHU is an essential etching/ashing model for many device fabrication processes.