Used AMS 602 #293608576 for sale

AMS 602 is a reactive ion etcher (RIE) used for deep etching and profiling of hard materials. It is designed to achieve excellent process repeatability and high process throughput. It has a high degree of process control and stable conditions, even in high-throughput applications. 602 is a high pressure equipment, with a maximum biased pressure of 1.5 Torr (1.5 × 10−3 mbar). This ensures that the process is highly repeatable and that the ion energy is not adversely affected by pressure fluctuations. AMS 602 is equipped with dual anode type cathodes, which allow it to achieve a high etch rate while preserving a high degree of process reproducibility. The dual electrodes are capable of providing independent control over the ion current, gas flows, and bias voltage, making it possible to take a wide range of process parameters into account when selecting the etching recipe. The system is also capable of providing a high degree of control over the etch selectivity and surface roughness. A high level of etch selectivity is important for achieving high quality etch profiles, while a low surface roughness minimizes material loss from over-etching. 602 is capable of providing this level of control through the use of specialized etching recipes and the addition of dopants and other materials to the etch gas. AMS 602 is equipped with an integrated water-cooling unit, which allows it to achieve high process speeds. The cooling machine also helps to keep the chiller and the tool components at a safe operating temperature, ensuring a high degree of reliability. The water-cooling asset is designed to cost-effectively cool the etch chamber, thereby optimizing the process speed, repeatability, and quality. Overall, 602 is an advanced reactive ion etcher (RIE) designed to provide excellent etch rates, process repeatability, and excellent results when used for deep etching and profiling of hard materials. Its combination of process control, high etch rates, and reliable water-cooling ensure excellent results, even in high-throughput applications.