Used ANELVA I 2100 SRE #293819948 for sale

ANELVA I 2100 SRE is a cutting-edge etcher/asher equipment which is designed to provide highly precise and efficient process capabilities for semiconductor manufacturing applications. This advanced tool is manufactured by ANELVA Corporation, a leading supplier of vacuum process equipment for the semiconductor industry. I 2100 SRE model is specifically engineered to meet the stringent requirements of modern semiconductor fabrication facilities, offering state-of-the-art features and capabilities to enable high-performance etching and ashing processes. One of the key features of ANELVA I 2100 SRE is its advanced vacuum technology, which enables precise control over the etching and ashing processes. The system is equipped with high-quality vacuum pumps and pumping systems to achieve and maintain the required vacuum levels for optimal process performance. This ensures that the processing chamber remains free from contaminants and unwanted gases, allowing for clean and uniform etching/ashing of semiconductor substrates. I 2100 SRE is also equipped with a sophisticated plasma generation unit, which is essential for producing the reactive species needed to etch or ash the semiconductor materials. The machine utilizes radio frequency (RF) plasma sources and matching networks to create a highly reactive plasma environment within the processing chamber. This plasma can be tailored to suit different etching/ashing requirements, enabling precise control over processing parameters such as etch rate, selectivity, and uniformity. In addition to its advanced vacuum and plasma systems, ANELVA I 2100 SRE features a comprehensive process control and monitoring tool. The asset is equipped with a user-friendly interface that allows operators to easily program and adjust process parameters such as gas flow rates, pressure levels, and RF power settings. Real-time monitoring capabilities enable operators to track key process metrics and make real-time adjustments to optimize process performance and ensure consistent results. I 2100 SRE is designed to support a wide range of semiconductor materials and process chemistries, making it a versatile tool for various etching and ashing applications. The model can accommodate different substrate sizes and shapes, allowing for flexibility in processing different types of semiconductor wafers and devices. Its robust design and construction ensure reliability and longevity, even in high-volume manufacturing environments. Overall, ANELVA I 2100 SRE is a cutting-edge etcher/asher equipment that offers superior performance, precision, and flexibility for semiconductor manufacturing applications. With its advanced vacuum and plasma technologies, comprehensive process control capabilities, and versatility in handling different materials and chemistries, this system is an ideal choice for semiconductor fabs looking to achieve high-quality results and maximize productivity in their etching and ashing processes.