Used ANTON PAAR HPA-S #293638236 for sale

ANTON PAAR HPA-S Etcher/Asher is an innovative, cost-effective etching and metal deposition equipment that is ideal for use in research laboratories and other applications. HPA-S system combines high-powered metal etching and deposition with excellent precision and accuracy. The unit can deposit metal layers up to a few microns thick on a variety of substrates (such as silicon, glass, ceramics, and metals). With its 5-axis robotic arm and a high-resolution precision electrostatic chuck, ANTON PAAR HPA-S combines accuracy, flexibility, and performance. HPA-S has a low profile, with a minimal foot print and is designed to fit in a variety of spaces. The turnkey machine is comprised of several components, including the high-precision etching chamber and the electrostatic chuck plate. Inside the chamber, a controlled atmosphere of hydrogen and nitrogen is used for etching and deposit work. The internal components are tailored for reliability, long-term performance, and optimal operation. The high-precision integration ensures excellent uniformity and accurate temperature control, enabling users to precisely step, spot, or sweep materials without altering their structure and properties. ANTON PAAR HPA-S follows the principle of combining a hydrogen plasma or argon-plasma with the Oxygen-Rich Plasma (ORP) technology. This enables the machine to achieve a very high precision for etching in different substrates. As an etcher, HPA-S is capable of achieving high resolution and high etch rate, and produces excellent final results with minimal sputtering, as well as better anisotropy. And as an asher, it can provide excellent uniformity on large parts and sides. ANTON PAAR HPA-S is designed to be used with applications such as semiconductor device fabrication, packaging, MEMS, and medical implants. In addition, HPA-S tool is equipped with the top-notch software that allows users to easily and quickly program their desired etching and deposition processes. The software adjust the various etching parameters and monitor the equipment's results in real-time, allowing for faster process cycle and higher production throughput. ANTON PAAR HPA-S also complies with the strict safety and environmental regulations, so users can be assured of safe and responsible operation. All in all, HPA-S offers an excellent and user-friendly solution for etching and metal deposition. With its combination of high-performance and high-precision capabilities, ANTON PAAR HPA-S is an indispensable tool for both research and industrial applications.