Used APTC Selex #9382377 for sale

APTC Selex
Manufacturer
APTC
Model
Selex
ID: 9382377
Si Etcher, 12" TSV Deep.
APTC Selex is an advanced plasma-enhanced chemical vapor deposition (PECVD), etching / ashing equipment that is designed to allow for precise control of process parameters. This precision control allows for the deposition and fabrication of small, high-precision metal structures and features. The system utilizes both high-frequency radio waves to create plasma discharges, as well as high-voltage DC arcs to etch materials with very high levels of precision. The combination of these two techniques makes Selex a very versatile unit for both deposition and etching / ashing. The machine comes with a variety of gas feed lines and chambers that are designed to optimize for different types of materials. This includes a high density quartz reactor that can provide uniform etching of a variety of materials. It also features a small secondary reactor with an adjustable temperature range for precise control over the etch pattern and material deposits. The precise control of the process parameters allows for repeatable and reliable fabrication of small high-precision structures. The tool also includes a set of easy-to-use controllers and software. The intuitive software allows for rapid setup and delivery of a range of process recipes that are specifically designed to handle the different materials utilized in the process. The software also allows for precise adjustments to be made for each of the individual process steps. This makes it easy to fine-tune the etching process for the best results. Another feature of APTC Selex asset is the ability to integrate a remote RFID code reader for automated tracking of processed parts. This can be utilized to provide a clear audit trail for any process step in the production cycle. This provides valuable data on each product produced, enabling manufacturers to improve production processes or identify production issues quickly and accurately. In summary, Selex is a versatile etching / ashing model that is capable of precisely etching and depositing a range of high-precision structures. It utilizes high-frequency radio waves to create plasma discharges and high-voltage DC arcs to etch materials. The user-friendly controls and software make it easy to fine-tune each process step allowing for repeatable results. The ability to integrate a remote RFID code reader also provides valuable data for production process improvement.
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