Used ARC ENERGY CHES400 #293667292 for sale

Manufacturer
ARC ENERGY
Model
CHES400
ID: 293667292
Vintage: 2008
Process chamber 2008 vintage.
ARC ENERGY CHES400 is an etcher/aser designed for easy operation for a variety of tasks. This piece of equipment utilizes a vacuum equipment to expose the device under test (DUT) to an intense plasma source, creating a highly selective and repeatable device etching or ashing process. This process chamber features a three-chamber design, with a pre-chamber to create the plasma, a reaction chamber to contain the vacuum etching or ashing process, and a gas delivery system to introduce the reactive gas to the reaction chamber. CHES400 equipment is equipped with a built-in RF generator, which produces a radio frequency signal to create the electro-spark plasma reaction. The RF power supply for ARC ENERGY CHES400 ranges from 0.05 to 15kW, enabling the operation of a wide range of plasma etching/ashing processes. A computer-controlled programmable logic controller allows for user programmable process configurations, giving users the ability to customize the process to meet their precise requirements. The sophisticated reticle positioning unit of CHES400 equipment includes advanced motion control capabilities. The equipment machine also includes a vacuum tool and gas delivery systems to ensure optimal operating conditions in the reaction chamber. To prevent excessive heating of the DUT, ARC ENERGY CHES400 also includes an advanced cooling asset to maintain etching temperatures at a predetermined setpoint. CHES400 also includes a top-hat type pressure chamber, allowing for automatic exhaust and venting of gasses from the reaction chamber. ARC ENERGY CHES400 equipment is designed to provide reliable, repeatable and reproducible etching / ashing operations, ensuring outstanding performance in a wide range of applications. The sophisticated model is capable of creating very uniform etching profiles with minimal material etching loss and minimal damage to the DUT. The etching/ashing process performed by this equipment is also highly selective and repeatable, resulting in consistent etching performance that is easy to manage. The equipment is also designed with safety features such as high-pressure sensors, emergency shut off, and alarms to protect personnel and equipment from hazardous situations. Overall, CHES400 is an advanced plasma etching/ashing equipment that provides users with reliable, repeatable and reproducible performance in a wide range of applications. This equipment is designed for easy operation and to provide outstanding flexibility for etch/ash developments and custom operations to suit specific etching needs.
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