Used AST / ADVANCED SYSTEM TECHNOLOGY CIRIE-100L #9059489 for sale
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ID: 9059489
Vintage: 2011
ICP-RIE system, 2"-8"
Specifications:
Chamber Materials: Anodized Al 6061T6
RF Power: 300 ~ 1000 W (Option)
Substrate Temperature Control: RT ~ 400℃
Wafer Numbers / Size: (30 -1) pcs / (2"- 8")
Gas Lines with MFCs: 6 Standard Lines
Reactor Base Pressure: < 1E-3 Torr
Process Pressure Range: From 50 mTorr to 10 Torr
Pumping System: Roots pump + Rotary pump or Dry pump(Option)
Load/Unload (Option): Vacuum Robot Transport
Load-Locks Pumping System (Option): Rotary Vane Pump
Load-Locks base Pressure (Option): < 1E-2 Torr
Non-Uniformity: 5% for WIW, WTW and RTR
Automatic Control System: Industrial PC with Graphic Control Interface
Power Requirement: AC220V, 3 phase, 60 Hz, 80A,
Gas Inlet Requirement: 1.2 kgw/cm2
CDA Requirement: 5 kgw/cm2
Water Requirement: 1.5 kgw/cm2, 20℃, 20 l/min
2011 vintage.
AST / ADVANCED SYSTEM TECHNOLOGY CIRIE-100L etcher/asher is a precision machine for performing advanced etching and ashing techniques on metal parts. The etcher/asher features a low-pressure, uniform, internal plasma jet, which can be used to both etch and asher components in a range of materials. AST CIRIE-100L is a benchtop machine, with a precise table and mounting systems that provide accurate positioning during etching and ashing. The etcher/asher is capable of achieving etch depths up to 0.0005 inches and depths up to 0.001 inches for ashing, as well as precise line width control and adjustable phase shifts. ADVANCED SYSTEM TECHNOLOGY CIRIE-100L etcher/asher is also equipped with advanced features for superior etch and asher performance. These features include electrostatic self-discharge, high-sharpness waveform control, VCV filtering, High Dynamic Range Control (HDRC) and Axial Control Acceleration (ACA), designed to ensure maximum accuracy and repeatability, as well as improved surface profiles for efficient material removal. CIRIE-100L etcher/asher is also equipped with advanced safety features, such as dry nitrogen supply sensors, gas monitoring and leak detectors, for prevention of accidental emissions. The etching and ashing processes are both controlled by an easy-to-use open-platform software suite that allows the operator to monitor the etch and ashing process in real-time. With its advanced safety measures, high precision and quality etching and ashing performance, AST / ADVANCED SYSTEM TECHNOLOGY CIRIE-100L etcher/asher is designed to be a reliable solution for advanced etching and ashing applications.
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