Used ATIS Tiwn station #9292738 for sale

ATIS Twyn Station is a high-speed etching/ashing instrument designed for use in a materials research laboratory. It is used for converting both flat and 3D samples into fine-grained, uniform substrates that can be used for further analysis. ATIS Twin Station offers several distinct advantages over conventional etching/ashing instruments, including the ability to process two wafers in parallel. This drastically reduces the instrument cycle time, allowing for faster turn-around on sample processing. It is capable of producing both an etch and an ashing step simultaneously on the same wafer, providing a single-step processing solution that is ideal for ultra-high-density devices. In addition, ATIS Twin Station is equipped with an extended automation functionality which adds efficiency and reproducibility to standard etching/ashing processes. This includes the capability for precise or recalibration of process parameters, off-site microscopying, and sample preparation via automated lift-off. In order to ensure consistent and uniform processing results, ATIS Twin Station is equipped with a vacuum chamber that can accommodate a wide range of temperature and pressure settings. The chamber also utilizes an adjustable stirring mechanism with a convenient sample loading system and internal heating coil for even heat distribution. In addition, ATIS Twin Station includes advanced diagnostics for monitoring gas flow, temperature, pressure, and chamber cleanliness during processing. This results in more accurate results with fewer process exposures and more consistent technique control. Overall, ATIS Twin Station is a sophisticated etching/ashing instrument, well suited for use in a research or manufacturing laboratory. Its advanced automation and process monitoring capabilities offer excellent reproducibility, while its two-wafer parallel processing method reduces turn-around time and improves end-product yields.