Used AVIZA / SPTS Omega i2L #293647178 for sale
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ID: 293647178
Wafer Size: 8"
Vintage: 2007
ICP Etcher, 8"
ICP Chamber
ESD Chuck
ESC
ADVANCED ENERGY Paramount 1513 RF Generator, 1.5 kW
HiLight 133 RF Generator, 300 W
Spectrum view / End point detector
Gases:
BROOKS AUTOMATION MFC
N2 (Purge)
Ar
N2
O2
O2
CHF3
CF4
BCL3
CL2
Missing parts:
CU500 Chiller
Dry pump
Panels
ISOPOD Power
2007 vintage.
SPTS Omega i2L is an advanced etcher / asher designed for high-vacuum processing of a range of materials. It features a powerful, flexible etching equipment with a large range of process options, enabling customers to quickly and reliably produce a variety of intricate features on a range of materials. The core of the system is a powerful single-wafer vacuum etcher source with a range of controlled etch gases, which offers a high degree of flexibility in the selection of etch processes. The etching source has a large etch rate range, from 3 to 200 nm/min, and is capable of performing reactive ion etching (RIE), isotropic etching, and deep anisotropic etching. It supports a wide range of well-defined etch gases, allowing etch processes tailored to the target material. Omega i2L also features a single-wafer asher. This allows customers to complete both etching and ashing processes on the same unit for improved efficiency and productivity. The asher features a high quality plasma source and is capable of ashing processes from 1000℃ to 600℃. It also features automated control over oxygen flow, making it easier to tune ashing processes depending on the target material. In addition to the etcher / asher, SPTS Omega i2L also includes an integrated vacuum machine with an electronic turbo pump and two roughing pumps, providing a high level of process stability and performance. This allows users to achieve high-vacuum process conditions in a range of chamber sizes, ensuring optimal process results. In summary, Omega i2L is an advanced etcher / asher that offers large range of process options, allowing customers to quickly and reliably produce intricate features on a range of materials. It also includes an integrated vacuum tool and a range of automated processes, providing a high level of performance and process stability. It is the ideal choice for a wide range of critical etching and ashing applications.
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