Used AXCELIS / FUSION 300 MM #9182227 for sale

AXCELIS / FUSION 300 MM etcher/asher is an advanced etching and ashing equipment designed to produce precision etched and ashed metallization patterns for fabrication of advanced semiconductor devices, MEMs, and 3D integration. The system is made up of two parts: the etcher and the asher. The etcher is equipped with a high power electron cyclotron resonance (ECR) ion source and a programmable multi-sided, internal, bi-directional, vector scanning, slit-scan electrostatic beam shaping unit. This allows for a very wide range of particles to be selected and varying etch vertical profile depth and uniformity according to the need of the application. The asher is equipped with a high power, integrated, multi-frequency, programmable, RF plasma source, that ensures uniform ashing across the entire workpiece, improving the time-to-market for advanced semiconductor device applications. The machine can handle FUSION 300 MM wafers and is built for high throughput and great accuracy in the fabrication processes. It features two separate gas shower assemblies (GSA) for optimal gas delivery. With dual sided process, the chamber is able to support up to eight processes, including etching, ashing, film deposition, cleaning, passivation, and patterning. It also includes an integrated multicolor scanner for monitoring process parameters in order to ensure reliable manufacturing of products with optimal performance. AXCELIS 300 MM asher/etcher is also highly customizable, enabling users to select the best process conditions for their applications. Through its software interface, the tool can handle a variety of process recipes. The recipes are managed in the asset database and are accessed or edited using a customizable graph based display. The model is also integrated with an operator console, providing an efficient way of monitoring the process and adjusting parameters in real-time to ensure the best results. 300 MM etcher/asher is CE and SEMI safety certified, and is a powerful tool for fabricating leading-edge materials that require intricate etch and ash processes. Its versatility and ease of use make it a great choice for companies looking to produce excellent quality semiconductor components.